JPS6445107A - Soft magnetic film for high frequency band and manufacture thereof - Google Patents

Soft magnetic film for high frequency band and manufacture thereof

Info

Publication number
JPS6445107A
JPS6445107A JP20095087A JP20095087A JPS6445107A JP S6445107 A JPS6445107 A JP S6445107A JP 20095087 A JP20095087 A JP 20095087A JP 20095087 A JP20095087 A JP 20095087A JP S6445107 A JPS6445107 A JP S6445107A
Authority
JP
Japan
Prior art keywords
soft magnetic
less
layers
amorphous structure
nonmagnetic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP20095087A
Other languages
Japanese (ja)
Other versions
JP2571062B2 (en
Inventor
Eishiyuu Sugawara
Makoto Tejima
Kazuhiro Kuroda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokin Corp
Original Assignee
Tokin Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokin Corp filed Critical Tokin Corp
Priority to JP62200950A priority Critical patent/JP2571062B2/en
Publication of JPS6445107A publication Critical patent/JPS6445107A/en
Application granted granted Critical
Publication of JP2571062B2 publication Critical patent/JP2571062B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Thin Magnetic Films (AREA)

Abstract

PURPOSE:To improve magnetic characteristics, by alternately arranging soft magnetic layers having a specified amorphous structure and nonmagnetic layers having a crystalline structure. CONSTITUTION:A deposited film has an (x) at % halogen element (Q), which is formed by a reactive film forming method; a (y) at % added element (M) (where y=0 is included); and (100-x-y) at % ferromagnetic element (R). At this time, (x+y) is in the range of 10 at % or more and 50 at % or less. Then, solft magnetic layers and nonmagnetic layers are alternately arranged. The soft magnetic layer has an amorphous structure, wherein (x) is 25 at % or less, in the thickness direction of the deposited film. The nonmagnetic layer has a high resistance crystalline structure, wherein (x) is 55 at % or more and 80 at % or less. Therefore, sputtering with halogen gas and a deposition rate are improved. The yield of columnar crystals is less. Thus the amorphous structure including halogen gas is formed. Therefore, the high angle type soft magnetic material having low coercive force is obtained.
JP62200950A 1987-08-13 1987-08-13 Soft magnetic film for high frequency band and method of manufacturing the same Expired - Fee Related JP2571062B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62200950A JP2571062B2 (en) 1987-08-13 1987-08-13 Soft magnetic film for high frequency band and method of manufacturing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62200950A JP2571062B2 (en) 1987-08-13 1987-08-13 Soft magnetic film for high frequency band and method of manufacturing the same

Publications (2)

Publication Number Publication Date
JPS6445107A true JPS6445107A (en) 1989-02-17
JP2571062B2 JP2571062B2 (en) 1997-01-16

Family

ID=16433004

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62200950A Expired - Fee Related JP2571062B2 (en) 1987-08-13 1987-08-13 Soft magnetic film for high frequency band and method of manufacturing the same

Country Status (1)

Country Link
JP (1) JP2571062B2 (en)

Also Published As

Publication number Publication date
JP2571062B2 (en) 1997-01-16

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees