JPS5715418A - Manufacture of semiconductor device - Google Patents
Manufacture of semiconductor deviceInfo
- Publication number
- JPS5715418A JPS5715418A JP8948580A JP8948580A JPS5715418A JP S5715418 A JPS5715418 A JP S5715418A JP 8948580 A JP8948580 A JP 8948580A JP 8948580 A JP8948580 A JP 8948580A JP S5715418 A JPS5715418 A JP S5715418A
- Authority
- JP
- Japan
- Prior art keywords
- added
- specified
- thickness
- forming region
- region
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000004065 semiconductor Substances 0.000 title 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 6
- 229910052681 coesite Inorganic materials 0.000 abstract 3
- 229910052906 cristobalite Inorganic materials 0.000 abstract 3
- 239000000377 silicon dioxide Substances 0.000 abstract 3
- 235000012239 silicon dioxide Nutrition 0.000 abstract 3
- 229910052682 stishovite Inorganic materials 0.000 abstract 3
- 229910052905 tridymite Inorganic materials 0.000 abstract 3
- 229910001218 Gallium arsenide Inorganic materials 0.000 abstract 2
- 230000003247 decreasing effect Effects 0.000 abstract 2
- 229910052581 Si3N4 Inorganic materials 0.000 abstract 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 abstract 1
- 230000003213 activating effect Effects 0.000 abstract 1
- 238000005530 etching Methods 0.000 abstract 1
- 239000012535 impurity Substances 0.000 abstract 1
- 150000002500 ions Chemical class 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/22—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
- H01L21/225—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities using diffusion into or out of a solid from or into a solid phase, e.g. a doped oxide layer
- H01L21/2258—Diffusion into or out of AIIIBV compounds
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8948580A JPS5715418A (en) | 1980-07-01 | 1980-07-01 | Manufacture of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8948580A JPS5715418A (en) | 1980-07-01 | 1980-07-01 | Manufacture of semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5715418A true JPS5715418A (en) | 1982-01-26 |
Family
ID=13972037
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8948580A Pending JPS5715418A (en) | 1980-07-01 | 1980-07-01 | Manufacture of semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5715418A (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2001006552A1 (en) * | 1999-07-15 | 2001-01-25 | Hrl Laboratories, Llc | Conductivity reduction method for doped compound semiconductors |
-
1980
- 1980-07-01 JP JP8948580A patent/JPS5715418A/ja active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2001006552A1 (en) * | 1999-07-15 | 2001-01-25 | Hrl Laboratories, Llc | Conductivity reduction method for doped compound semiconductors |
US6444552B1 (en) | 1999-07-15 | 2002-09-03 | Hrl Laboratories, Llc | Method of reducing the conductivity of a semiconductor and devices made thereby |
US6897132B2 (en) * | 1999-07-15 | 2005-05-24 | Hrl Laboratories, Llc | Method of reducing the conductivity of a semiconductor and devices made thereby |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS54140483A (en) | Semiconductor device | |
JPS5766674A (en) | Semiconductor device | |
JPS57192063A (en) | Manufacture of semiconductor device | |
JPS5715418A (en) | Manufacture of semiconductor device | |
JPS5633881A (en) | Manufacture of semiconductor device | |
JPS5643756A (en) | Manufacture of semiconductor device | |
JPS56155531A (en) | Manufacture of semiconductor device | |
JPS56134739A (en) | Manufacture of semiconductor device | |
JPS54162461A (en) | Manufacture for semiconductor device | |
JPS5739579A (en) | Mos semiconductor device and manufacture thereof | |
JPS57106169A (en) | Manufacture of semiconductor device | |
JPS57143854A (en) | Complementary type metal oxide semiconductor device and its manufacture | |
JPS5533037A (en) | Manufacture of semiconductor device | |
JPS5784164A (en) | Manufacture of semiconductor device | |
JPS5785260A (en) | Manufacture of metal oxide semiconductor transistor | |
JPS56115570A (en) | Manufacture of semiconductor device | |
JPS55102269A (en) | Method of fabricating semiconductor device | |
JPS57153462A (en) | Manufacture of semiconductor integrated circuit device | |
JPS5715471A (en) | Junction type field effect semiconductor device and manufacture thereof | |
JPS57128067A (en) | Manufacture of semiconductor device | |
JPS57136343A (en) | Manufacture of semiconductor device | |
JPS54122982A (en) | Manufacture for complementary mos integrated circuit device | |
JPS57180122A (en) | Manufacture of semiconductor device | |
JPS5756976A (en) | Manufacture of junction type field effect transistor | |
JPS5752166A (en) | Manufacture of semiconductor device |