JPS57150212A - Surface acoustic wave filter - Google Patents
Surface acoustic wave filterInfo
- Publication number
- JPS57150212A JPS57150212A JP3506481A JP3506481A JPS57150212A JP S57150212 A JPS57150212 A JP S57150212A JP 3506481 A JP3506481 A JP 3506481A JP 3506481 A JP3506481 A JP 3506481A JP S57150212 A JPS57150212 A JP S57150212A
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- absorption film
- acoustic absorption
- solder resist
- accuracy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/46—Filters
- H03H9/64—Filters using surface acoustic waves
Landscapes
- Physics & Mathematics (AREA)
- Acoustics & Sound (AREA)
- Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
Abstract
PURPOSE:To raise pattern accuracy, by using a solder resist as an acoustic absorption film, and forming a pattern by a photoetching technique. CONSTITUTION:An acoustic absorption film provided with high position accuracy and pattern accuracy is obtained by forming an electrode pattern group consisting of an input transducer 1, an output transducer 4, a multistrip coupler 3, etc., on a piezoelectric crystal substrate by use of photoetching technique, and after that, applying a solder resist by scores of mum in thickness by use of the screen printing method, sensitizing acoustic absorption film patterns 7, 8 and 9 by the projection exposure method or the adhesion exposure method, and after that, melting and removing the solder resist except the acoustic absorption film pattern by the developing operation.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3506481A JPS57150212A (en) | 1981-03-11 | 1981-03-11 | Surface acoustic wave filter |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3506481A JPS57150212A (en) | 1981-03-11 | 1981-03-11 | Surface acoustic wave filter |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS57150212A true JPS57150212A (en) | 1982-09-17 |
Family
ID=12431585
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3506481A Pending JPS57150212A (en) | 1981-03-11 | 1981-03-11 | Surface acoustic wave filter |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57150212A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5974718A (en) * | 1982-09-21 | 1984-04-27 | シ−メンス・アクチエンゲゼルシヤフト | Surface wave filter and method of producing same |
| JPS5974719A (en) * | 1982-09-23 | 1984-04-27 | シ−メンス・アクチエンゲゼルシヤフト | Surface wave filter and method of producing same |
| US4931752A (en) * | 1987-09-30 | 1990-06-05 | Hewlett-Packard Company | Polyimide damper for surface acoustic wave device |
-
1981
- 1981-03-11 JP JP3506481A patent/JPS57150212A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5974718A (en) * | 1982-09-21 | 1984-04-27 | シ−メンス・アクチエンゲゼルシヤフト | Surface wave filter and method of producing same |
| JPS5974719A (en) * | 1982-09-23 | 1984-04-27 | シ−メンス・アクチエンゲゼルシヤフト | Surface wave filter and method of producing same |
| US4931752A (en) * | 1987-09-30 | 1990-06-05 | Hewlett-Packard Company | Polyimide damper for surface acoustic wave device |
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