JPS57141642A - Formation of pattern - Google Patents

Formation of pattern

Info

Publication number
JPS57141642A
JPS57141642A JP56027482A JP2748281A JPS57141642A JP S57141642 A JPS57141642 A JP S57141642A JP 56027482 A JP56027482 A JP 56027482A JP 2748281 A JP2748281 A JP 2748281A JP S57141642 A JPS57141642 A JP S57141642A
Authority
JP
Japan
Prior art keywords
layer
resist
pattern
etching
worked
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56027482A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6364772B2 (enrdf_load_stackoverflow
Inventor
Yasuhiro Yoneda
Tateo Kitamura
Jiro Naito
Toshisuke Kitakoji
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP56027482A priority Critical patent/JPS57141642A/ja
Publication of JPS57141642A publication Critical patent/JPS57141642A/ja
Publication of JPS6364772B2 publication Critical patent/JPS6364772B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP56027482A 1981-02-26 1981-02-26 Formation of pattern Granted JPS57141642A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56027482A JPS57141642A (en) 1981-02-26 1981-02-26 Formation of pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56027482A JPS57141642A (en) 1981-02-26 1981-02-26 Formation of pattern

Publications (2)

Publication Number Publication Date
JPS57141642A true JPS57141642A (en) 1982-09-02
JPS6364772B2 JPS6364772B2 (enrdf_load_stackoverflow) 1988-12-13

Family

ID=12222341

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56027482A Granted JPS57141642A (en) 1981-02-26 1981-02-26 Formation of pattern

Country Status (1)

Country Link
JP (1) JPS57141642A (enrdf_load_stackoverflow)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5965430A (ja) * 1982-10-06 1984-04-13 Matsushita Electric Ind Co Ltd 半導体装置の製造方法
WO1986005284A1 (en) * 1985-03-07 1986-09-12 Hughes Aircraft Company Polysiloxane resist for ion beam and electron beam lithography
US4863833A (en) * 1984-05-30 1989-09-05 Fujitsu Limited Pattern-forming material and its production and use
US8992806B2 (en) 2003-11-18 2015-03-31 Honeywell International Inc. Antireflective coatings for via fill and photolithography applications and methods of preparation thereof

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0210032U (enrdf_load_stackoverflow) * 1988-06-24 1990-01-23

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5965430A (ja) * 1982-10-06 1984-04-13 Matsushita Electric Ind Co Ltd 半導体装置の製造方法
US4863833A (en) * 1984-05-30 1989-09-05 Fujitsu Limited Pattern-forming material and its production and use
WO1986005284A1 (en) * 1985-03-07 1986-09-12 Hughes Aircraft Company Polysiloxane resist for ion beam and electron beam lithography
US8992806B2 (en) 2003-11-18 2015-03-31 Honeywell International Inc. Antireflective coatings for via fill and photolithography applications and methods of preparation thereof

Also Published As

Publication number Publication date
JPS6364772B2 (enrdf_load_stackoverflow) 1988-12-13

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