JPS57138757A - Correction of deflection distortion - Google Patents

Correction of deflection distortion

Info

Publication number
JPS57138757A
JPS57138757A JP56024327A JP2432781A JPS57138757A JP S57138757 A JPS57138757 A JP S57138757A JP 56024327 A JP56024327 A JP 56024327A JP 2432781 A JP2432781 A JP 2432781A JP S57138757 A JPS57138757 A JP S57138757A
Authority
JP
Japan
Prior art keywords
deflector
calibration
small area
deflection
deflection distortion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56024327A
Other languages
English (en)
Other versions
JPH0324771B2 (ja
Inventor
Norio Saito
Susumu Ozasa
Nobuo Shimazu
Tsuneo Okubo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Nippon Telegraph and Telephone Corp
Original Assignee
Hitachi Ltd
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd, Nippon Telegraph and Telephone Corp filed Critical Hitachi Ltd
Priority to JP56024327A priority Critical patent/JPS57138757A/ja
Priority to US06/347,719 priority patent/US4443703A/en
Priority to DE3206374A priority patent/DE3206374C2/de
Publication of JPS57138757A publication Critical patent/JPS57138757A/ja
Publication of JPH0324771B2 publication Critical patent/JPH0324771B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
JP56024327A 1981-02-23 1981-02-23 Correction of deflection distortion Granted JPS57138757A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP56024327A JPS57138757A (en) 1981-02-23 1981-02-23 Correction of deflection distortion
US06/347,719 US4443703A (en) 1981-02-23 1982-02-10 Method and apparatus of deflection calibration for a charged particle beam exposure apparatus
DE3206374A DE3206374C2 (de) 1981-02-23 1982-02-22 Verfahren und Vorrichtung zum Eichen der Ablenkung eines aus geladenen Teilchen bestehenden Strahls

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56024327A JPS57138757A (en) 1981-02-23 1981-02-23 Correction of deflection distortion

Publications (2)

Publication Number Publication Date
JPS57138757A true JPS57138757A (en) 1982-08-27
JPH0324771B2 JPH0324771B2 (ja) 1991-04-04

Family

ID=12135078

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56024327A Granted JPS57138757A (en) 1981-02-23 1981-02-23 Correction of deflection distortion

Country Status (3)

Country Link
US (1) US4443703A (ja)
JP (1) JPS57138757A (ja)
DE (1) DE3206374C2 (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60126827A (ja) * 1983-12-13 1985-07-06 Fujitsu Ltd 電子ビ−ム露光方法
JP2009158138A (ja) * 2007-12-25 2009-07-16 Toshiba Corp Ｘ線管及びｘ線ｃｔ装置

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59124719A (ja) * 1982-12-29 1984-07-18 Fujitsu Ltd 電子ビ−ム露光装置
JPS6229135A (ja) * 1985-07-29 1987-02-07 Advantest Corp 荷電粒子ビ−ム露光方法及びこの方法を用いた荷電粒子ビ−ム露光装置
US4812661A (en) * 1986-08-20 1989-03-14 Hewlett-Packard Company Method and apparatus for hybrid I.C. lithography
US5047175A (en) * 1987-12-23 1991-09-10 The Lubrizol Corporation Salt composition and explosives using same
US5136169A (en) * 1991-04-05 1992-08-04 Massachusetts Institute Of Technology Energy beam locating
JP3192500B2 (ja) * 1992-11-19 2001-07-30 株式会社日立製作所 電子線描画方法および電子線描画装置
JPH07191199A (ja) * 1993-12-27 1995-07-28 Fujitsu Ltd 荷電粒子ビーム露光システム及び露光方法
JP3946899B2 (ja) * 1999-03-26 2007-07-18 株式会社東芝 エネルギービーム装置における光学系の調整方法
US6781680B1 (en) * 1999-03-26 2004-08-24 Kabushiki Kaisha Toshiba Optical system adjusting method for energy beam apparatus
EP1428006B1 (en) * 2001-01-26 2012-10-03 Fei Company Method and apparatus for scanned instrument calibration
US6770867B2 (en) 2001-06-29 2004-08-03 Fei Company Method and apparatus for scanned instrument calibration
JP4167904B2 (ja) 2003-01-06 2008-10-22 株式会社日立ハイテクノロジーズ 電子ビーム描画装置及び電子ビーム描画方法
US7105843B1 (en) * 2005-05-27 2006-09-12 Applied Materials, Israel, Ltd. Method and system for controlling focused ion beam alignment with a sample
EP3183082B1 (en) * 2014-08-20 2024-02-28 Arcam Ab Energy beam size verification
US9341467B2 (en) * 2014-08-20 2016-05-17 Arcam Ab Energy beam position verification
WO2016026663A1 (en) * 2014-08-20 2016-02-25 Arcam Ab Energy beam deflection speed verification
CN117961100B (zh) * 2024-03-29 2024-07-02 西安赛隆增材技术股份有限公司 一种用于金属粉末加工的电子束标定方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60126827A (ja) * 1983-12-13 1985-07-06 Fujitsu Ltd 電子ビ−ム露光方法
JPH0515056B2 (ja) * 1983-12-13 1993-02-26 Fujitsu Ltd
JP2009158138A (ja) * 2007-12-25 2009-07-16 Toshiba Corp Ｘ線管及びｘ線ｃｔ装置

Also Published As

Publication number Publication date
JPH0324771B2 (ja) 1991-04-04
US4443703A (en) 1984-04-17
DE3206374A1 (de) 1982-09-09
DE3206374C2 (de) 1986-03-27

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