JPS57128929A - Semiconductor device and manufacture of the same - Google Patents

Semiconductor device and manufacture of the same

Info

Publication number
JPS57128929A
JPS57128929A JP56015489A JP1548981A JPS57128929A JP S57128929 A JPS57128929 A JP S57128929A JP 56015489 A JP56015489 A JP 56015489A JP 1548981 A JP1548981 A JP 1548981A JP S57128929 A JPS57128929 A JP S57128929A
Authority
JP
Japan
Prior art keywords
photoresistor
film
ion
layer
hardened
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56015489A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6326539B2 (enExample
Inventor
Kimiyoshi Kimura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP56015489A priority Critical patent/JPS57128929A/ja
Publication of JPS57128929A publication Critical patent/JPS57128929A/ja
Publication of JPS6326539B2 publication Critical patent/JPS6326539B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/68—Organic materials, e.g. photoresists
    • H10P14/683—Organic materials, e.g. photoresists carbon-based polymeric organic materials, e.g. polyimides, poly cyclobutene or PVC

Landscapes

  • Electrodes Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Formation Of Insulating Films (AREA)
JP56015489A 1981-02-04 1981-02-04 Semiconductor device and manufacture of the same Granted JPS57128929A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56015489A JPS57128929A (en) 1981-02-04 1981-02-04 Semiconductor device and manufacture of the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56015489A JPS57128929A (en) 1981-02-04 1981-02-04 Semiconductor device and manufacture of the same

Publications (2)

Publication Number Publication Date
JPS57128929A true JPS57128929A (en) 1982-08-10
JPS6326539B2 JPS6326539B2 (enExample) 1988-05-30

Family

ID=11890203

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56015489A Granted JPS57128929A (en) 1981-02-04 1981-02-04 Semiconductor device and manufacture of the same

Country Status (1)

Country Link
JP (1) JPS57128929A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117594462A (zh) * 2023-11-21 2024-02-23 颀中科技(苏州)有限公司 凸块的成型方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117594462A (zh) * 2023-11-21 2024-02-23 颀中科技(苏州)有限公司 凸块的成型方法

Also Published As

Publication number Publication date
JPS6326539B2 (enExample) 1988-05-30

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