JPS57128924A - Mask positioning and equipment for the same - Google Patents

Mask positioning and equipment for the same

Info

Publication number
JPS57128924A
JPS57128924A JP56014302A JP1430281A JPS57128924A JP S57128924 A JPS57128924 A JP S57128924A JP 56014302 A JP56014302 A JP 56014302A JP 1430281 A JP1430281 A JP 1430281A JP S57128924 A JPS57128924 A JP S57128924A
Authority
JP
Japan
Prior art keywords
output
targets
recognition process
process circuit
pulse
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56014302A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0159732B2 (enExample
Inventor
Yoshihiko Kiyokuni
Masaki Tsukagoshi
Tetsuo Noguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP56014302A priority Critical patent/JPS57128924A/ja
Publication of JPS57128924A publication Critical patent/JPS57128924A/ja
Publication of JPH0159732B2 publication Critical patent/JPH0159732B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P95/00—

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP56014302A 1981-02-04 1981-02-04 Mask positioning and equipment for the same Granted JPS57128924A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56014302A JPS57128924A (en) 1981-02-04 1981-02-04 Mask positioning and equipment for the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56014302A JPS57128924A (en) 1981-02-04 1981-02-04 Mask positioning and equipment for the same

Publications (2)

Publication Number Publication Date
JPS57128924A true JPS57128924A (en) 1982-08-10
JPH0159732B2 JPH0159732B2 (enExample) 1989-12-19

Family

ID=11857296

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56014302A Granted JPS57128924A (en) 1981-02-04 1981-02-04 Mask positioning and equipment for the same

Country Status (1)

Country Link
JP (1) JPS57128924A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63197953A (ja) * 1987-02-10 1988-08-16 Orc Mfg Co Ltd マスクフイルムとワ−ク基板との自動位置決め方法
JP2006145030A (ja) * 2004-10-22 2006-06-08 Celaya Emparanza Y Galdos Internacional Sa 家庭で用いる加圧水蒸気発生装置用安全遮断機構

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63197953A (ja) * 1987-02-10 1988-08-16 Orc Mfg Co Ltd マスクフイルムとワ−ク基板との自動位置決め方法
JP2006145030A (ja) * 2004-10-22 2006-06-08 Celaya Emparanza Y Galdos Internacional Sa 家庭で用いる加圧水蒸気発生装置用安全遮断機構

Also Published As

Publication number Publication date
JPH0159732B2 (enExample) 1989-12-19

Similar Documents

Publication Publication Date Title
JPS643778A (en) Installation supervisory equipment
JPS575019A (en) Focus controller
JPS57128924A (en) Mask positioning and equipment for the same
JPS53117978A (en) Automatic mask appearance inspection apparatus
JPS57167651A (en) Inspecting device for surface of semiconductor wafer
JPS5671173A (en) Pattern detection method of printed circuit substrate
EP0738086A3 (en) Automatic white-balance controlling apparatus
JPS5545501A (en) Soldering tool
JPS57147245A (en) Positioning method and device for chip bonding
JPS5387667A (en) Detecting method for etching end point of non-conductive film
JPS57160135A (en) Automatic bonding method for inner lead
JPS57161747A (en) Method and device for selecting decomposition condition
JPS52155051A (en) Production of semiconductor device
JPS5385159A (en) Production of using semiconductor support and semiconductor device usingsemiconductor support
JPS557756A (en) Projector
JPS55133538A (en) Manufacturing method of semiconductor device
JPS61252517A (ja) ズ−ムレンズの倍率設定装置
JPS55109964A (en) Supervising method for surface of continuous casting piece
JPS57154010A (en) Position recognizing method
JPS6478388A (en) Method for recognizing work by image processing
JPS56161167A (en) Method of carving printing block
JPS53144670A (en) Production of semiconductor device
JPS5293065A (en) Automatic hooking method of suspended matter to be conveyed by crane a nd apparatus therefor
JPS52155054A (en) Production of semiconductor device
JPS53113730A (en) Metallic pattern forming method