JPS57128924A - Mask positioning and equipment for the same - Google Patents
Mask positioning and equipment for the sameInfo
- Publication number
- JPS57128924A JPS57128924A JP56014302A JP1430281A JPS57128924A JP S57128924 A JPS57128924 A JP S57128924A JP 56014302 A JP56014302 A JP 56014302A JP 1430281 A JP1430281 A JP 1430281A JP S57128924 A JPS57128924 A JP S57128924A
- Authority
- JP
- Japan
- Prior art keywords
- output
- targets
- recognition process
- process circuit
- pulse
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 abstract 4
- 239000000284 extract Substances 0.000 abstract 1
- 238000005070 sampling Methods 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56014302A JPS57128924A (en) | 1981-02-04 | 1981-02-04 | Mask positioning and equipment for the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56014302A JPS57128924A (en) | 1981-02-04 | 1981-02-04 | Mask positioning and equipment for the same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57128924A true JPS57128924A (en) | 1982-08-10 |
| JPH0159732B2 JPH0159732B2 (enExample) | 1989-12-19 |
Family
ID=11857296
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56014302A Granted JPS57128924A (en) | 1981-02-04 | 1981-02-04 | Mask positioning and equipment for the same |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57128924A (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63197953A (ja) * | 1987-02-10 | 1988-08-16 | Orc Mfg Co Ltd | マスクフイルムとワ−ク基板との自動位置決め方法 |
| JP2006145030A (ja) * | 2004-10-22 | 2006-06-08 | Celaya Emparanza Y Galdos Internacional Sa | 家庭で用いる加圧水蒸気発生装置用安全遮断機構 |
-
1981
- 1981-02-04 JP JP56014302A patent/JPS57128924A/ja active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63197953A (ja) * | 1987-02-10 | 1988-08-16 | Orc Mfg Co Ltd | マスクフイルムとワ−ク基板との自動位置決め方法 |
| JP2006145030A (ja) * | 2004-10-22 | 2006-06-08 | Celaya Emparanza Y Galdos Internacional Sa | 家庭で用いる加圧水蒸気発生装置用安全遮断機構 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0159732B2 (enExample) | 1989-12-19 |
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