JPS5712587A - Hetero-structure semiconductor laser - Google Patents
Hetero-structure semiconductor laserInfo
- Publication number
- JPS5712587A JPS5712587A JP8704680A JP8704680A JPS5712587A JP S5712587 A JPS5712587 A JP S5712587A JP 8704680 A JP8704680 A JP 8704680A JP 8704680 A JP8704680 A JP 8704680A JP S5712587 A JPS5712587 A JP S5712587A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- substrate
- type
- active layer
- protrusion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/227—Buried mesa structure ; Striped active layer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/227—Buried mesa structure ; Striped active layer
- H01S5/2275—Buried mesa structure ; Striped active layer mesa created by etching
Landscapes
- Semiconductor Lasers (AREA)
Abstract
PURPOSE:To form the epitaxial layer easily as well as to stabilize the single lateral mode oscillation for the subject semiconductor laser by a method wherein a concaved section having a flat bottom is provided at the top of the narrow-stripped protrusion on a substrate and a flat waveguide layer having an intermediate refractive index between the active layer and the substrate, and an active layer are provided at the concaved section. CONSTITUTION:The narrow-stripped protrusion 1b is formed on the N type InP substrate 1 by performing a photoetching method and a concaved section, having the flat bottom, is formed at the top of the protrusion 1b. On the substrate 1 whereon the concaved section has been formed as above, a waveguide layer 21, a semiconductor layer 22, N type active layers 14 and 15, a P type clad layer 6 and an N type cap layer 7 are epitaxially grown successively. Besides, a P type current injection layer 8 is formed in such manner that the layer will not reach the active layer 15 from the upper section of the mesa structure, an N type and a P type ohmic electrodes 9 and 10 are formed on the substrate 1 and the layer 7, and then the concaved section is formed, thereby enabling to easily form the flat waveguide layer 21, having the intermediate refractive index between the substrate 1 and the active layer 15, and the active layer 15.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8704680A JPS5712587A (en) | 1980-06-26 | 1980-06-26 | Hetero-structure semiconductor laser |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8704680A JPS5712587A (en) | 1980-06-26 | 1980-06-26 | Hetero-structure semiconductor laser |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5712587A true JPS5712587A (en) | 1982-01-22 |
Family
ID=13903990
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8704680A Pending JPS5712587A (en) | 1980-06-26 | 1980-06-26 | Hetero-structure semiconductor laser |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5712587A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57177086U (en) * | 1981-05-06 | 1982-11-09 | ||
JPS61192271A (en) * | 1985-02-20 | 1986-08-26 | Nitto Seifun Kk | Buckwheat tea |
JPS6460343A (en) * | 1987-08-28 | 1989-03-07 | Masayuki Yano | Konjak vermicelli |
-
1980
- 1980-06-26 JP JP8704680A patent/JPS5712587A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57177086U (en) * | 1981-05-06 | 1982-11-09 | ||
JPS6225179Y2 (en) * | 1981-05-06 | 1987-06-27 | ||
JPS61192271A (en) * | 1985-02-20 | 1986-08-26 | Nitto Seifun Kk | Buckwheat tea |
JPH0581231B2 (en) * | 1985-02-20 | 1993-11-11 | Nitto Flour Milling | |
JPS6460343A (en) * | 1987-08-28 | 1989-03-07 | Masayuki Yano | Konjak vermicelli |
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