JPS57117283A - 3-5 group compound semiconductor device - Google Patents
3-5 group compound semiconductor deviceInfo
- Publication number
- JPS57117283A JPS57117283A JP449481A JP449481A JPS57117283A JP S57117283 A JPS57117283 A JP S57117283A JP 449481 A JP449481 A JP 449481A JP 449481 A JP449481 A JP 449481A JP S57117283 A JPS57117283 A JP S57117283A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- film
- tin
- ohmic contact
- gap
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/36—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
- H01L33/40—Materials therefor
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/484—Connecting portions
- H01L2224/48463—Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond
- H01L2224/48465—Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond the other connecting portion not on the bonding area being a wedge bond, i.e. ball-to-wedge, regular stitch
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73251—Location after the connecting process on different surfaces
- H01L2224/73265—Layer and wire connectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/26—Materials of the light emitting region
- H01L33/30—Materials of the light emitting region containing only elements of group III and group V of the periodic system
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/36—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
- H01L33/38—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape
Abstract
PURPOSE:To make better the ohmic contact and wire bonding property by a method wherein an Au-Be layer is provided as an electrode, and an Al layer is provided on the layer thereof interposing middle layers of a TiN layer, etc., between them. CONSTITUTION:An N type GaP layer 11, P type GaP layer 12 are made to grow on an N type GaP substrate 10 by liquid phase epitaxial growth method to form a P-N junction 13. Then Au-Si films 19 are formed on the rear as the electrodes on the N side, and an Au-Be film 14, a TiN film 15, a Ti film 16, a TiN film 17 and the Al film 18 are accumulated in order on the surface of the P type layer by the sputtering method. Accordingly because the middle layers of the TiN-Ti-TiN layers act as the barrier to prevent diffusion of Au, Be to be generated when the heat treatment to obtain ohmic contact is to be performed and Ga in the GaP substrate into the surface of electrode, mixing of impurities into the Al film on the surface is not generated, and alloying of GaP and Au-Be being necessary to obtain favorable ohmic contact can be performed stably.
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP449481A JPS57117283A (en) | 1981-01-13 | 1981-01-13 | 3-5 group compound semiconductor device |
NLAANVRAGE8200038,A NL186354C (en) | 1981-01-13 | 1982-01-07 | SEMICONDUCTOR DEVICE COMPRISING III-V CONNECTIONS WITH A COMPOSITE ELECTRODE. |
DE19823200788 DE3200788A1 (en) | 1981-01-13 | 1982-01-13 | ELECTRODE FOR SEMICONDUCTOR COMPONENTS |
US06/681,710 US4553154A (en) | 1981-01-13 | 1984-12-13 | Light emitting diode electrode |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP449481A JPS57117283A (en) | 1981-01-13 | 1981-01-13 | 3-5 group compound semiconductor device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57117283A true JPS57117283A (en) | 1982-07-21 |
JPS6244836B2 JPS6244836B2 (en) | 1987-09-22 |
Family
ID=11585622
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP449481A Granted JPS57117283A (en) | 1981-01-13 | 1981-01-13 | 3-5 group compound semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57117283A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0463480A (en) * | 1990-07-02 | 1992-02-28 | Sharp Corp | Group iii-v compound semiconductor device |
JP2008098336A (en) * | 2006-10-11 | 2008-04-24 | Stanley Electric Co Ltd | Semiconductor light emitting element, and its manufacturing method |
JP2020202350A (en) * | 2019-06-13 | 2020-12-17 | ローム株式会社 | Semiconductor light emitting device |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5411689A (en) * | 1977-06-28 | 1979-01-27 | Toshiba Corp | Light emitting element of gallium phosphide |
JPS5575276A (en) * | 1978-12-02 | 1980-06-06 | Sharp Corp | 3[5 group compound semiconductor device |
-
1981
- 1981-01-13 JP JP449481A patent/JPS57117283A/en active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5411689A (en) * | 1977-06-28 | 1979-01-27 | Toshiba Corp | Light emitting element of gallium phosphide |
JPS5575276A (en) * | 1978-12-02 | 1980-06-06 | Sharp Corp | 3[5 group compound semiconductor device |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0463480A (en) * | 1990-07-02 | 1992-02-28 | Sharp Corp | Group iii-v compound semiconductor device |
JP2008098336A (en) * | 2006-10-11 | 2008-04-24 | Stanley Electric Co Ltd | Semiconductor light emitting element, and its manufacturing method |
JP2020202350A (en) * | 2019-06-13 | 2020-12-17 | ローム株式会社 | Semiconductor light emitting device |
Also Published As
Publication number | Publication date |
---|---|
JPS6244836B2 (en) | 1987-09-22 |
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