JPS5710929A - Exposing method by electron beam - Google Patents
Exposing method by electron beamInfo
- Publication number
- JPS5710929A JPS5710929A JP8547680A JP8547680A JPS5710929A JP S5710929 A JPS5710929 A JP S5710929A JP 8547680 A JP8547680 A JP 8547680A JP 8547680 A JP8547680 A JP 8547680A JP S5710929 A JPS5710929 A JP S5710929A
- Authority
- JP
- Japan
- Prior art keywords
- marks
- mark
- hand corner
- wafer
- fields
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000010894 electron beam technology Methods 0.000 title abstract 3
- 238000000034 method Methods 0.000 title abstract 2
- 230000002093 peripheral effect Effects 0.000 abstract 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Analytical Chemistry (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Electron Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8547680A JPS5710929A (en) | 1980-06-24 | 1980-06-24 | Exposing method by electron beam |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8547680A JPS5710929A (en) | 1980-06-24 | 1980-06-24 | Exposing method by electron beam |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5710929A true JPS5710929A (en) | 1982-01-20 |
JPS6235262B2 JPS6235262B2 (enrdf_load_stackoverflow) | 1987-07-31 |
Family
ID=13859955
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8547680A Granted JPS5710929A (en) | 1980-06-24 | 1980-06-24 | Exposing method by electron beam |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5710929A (enrdf_load_stackoverflow) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60205767A (ja) * | 1984-03-30 | 1985-10-17 | Fujitsu Ltd | デ−タ処理装置 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0320669A (ja) * | 1989-05-20 | 1991-01-29 | Sanyo Electric Co Ltd | 自転車用速度表示装置 |
-
1980
- 1980-06-24 JP JP8547680A patent/JPS5710929A/ja active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60205767A (ja) * | 1984-03-30 | 1985-10-17 | Fujitsu Ltd | デ−タ処理装置 |
Also Published As
Publication number | Publication date |
---|---|
JPS6235262B2 (enrdf_load_stackoverflow) | 1987-07-31 |
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