JPS56122034A - Photomask - Google Patents

Photomask

Info

Publication number
JPS56122034A
JPS56122034A JP2542380A JP2542380A JPS56122034A JP S56122034 A JPS56122034 A JP S56122034A JP 2542380 A JP2542380 A JP 2542380A JP 2542380 A JP2542380 A JP 2542380A JP S56122034 A JPS56122034 A JP S56122034A
Authority
JP
Japan
Prior art keywords
pattern
semiconductor chip
corner parts
round
photomask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2542380A
Other languages
Japanese (ja)
Other versions
JPS6148706B2 (en
Inventor
Kazuyuki Sakamoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP2542380A priority Critical patent/JPS56122034A/en
Publication of JPS56122034A publication Critical patent/JPS56122034A/en
Publication of JPS6148706B2 publication Critical patent/JPS6148706B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/40—Electrostatic discharge [ESD] related features, e.g. antistatic coatings or a conductive metal layer around the periphery of the mask substrate

Abstract

PURPOSE:To prevent the electrostatic breakdown of a pattern to be formed into a semiconductor chip due to contact exposure by making corner parts of the pattern round. CONSTITUTION:All or a part of the corner parts of pattern 1 to be formed into a semiconductor chip are made round by cutting, rounding or other method.
JP2542380A 1980-02-29 1980-02-29 Photomask Granted JPS56122034A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2542380A JPS56122034A (en) 1980-02-29 1980-02-29 Photomask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2542380A JPS56122034A (en) 1980-02-29 1980-02-29 Photomask

Publications (2)

Publication Number Publication Date
JPS56122034A true JPS56122034A (en) 1981-09-25
JPS6148706B2 JPS6148706B2 (en) 1986-10-25

Family

ID=12165540

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2542380A Granted JPS56122034A (en) 1980-02-29 1980-02-29 Photomask

Country Status (1)

Country Link
JP (1) JPS56122034A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60154959U (en) * 1984-03-23 1985-10-16 ホ−ヤ株式会社 photo mask pattern
JPH0239152A (en) * 1988-07-29 1990-02-08 Sony Corp Optical exposure mask
JP2012169457A (en) * 2011-02-14 2012-09-06 Ngk Spark Plug Co Ltd Wiring board manufacturing method

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63124904U (en) * 1987-02-06 1988-08-15

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60154959U (en) * 1984-03-23 1985-10-16 ホ−ヤ株式会社 photo mask pattern
JPH0239152A (en) * 1988-07-29 1990-02-08 Sony Corp Optical exposure mask
JP2012169457A (en) * 2011-02-14 2012-09-06 Ngk Spark Plug Co Ltd Wiring board manufacturing method

Also Published As

Publication number Publication date
JPS6148706B2 (en) 1986-10-25

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