JPS57104933A - See-through glass mask - Google Patents

See-through glass mask

Info

Publication number
JPS57104933A
JPS57104933A JP18175480A JP18175480A JPS57104933A JP S57104933 A JPS57104933 A JP S57104933A JP 18175480 A JP18175480 A JP 18175480A JP 18175480 A JP18175480 A JP 18175480A JP S57104933 A JPS57104933 A JP S57104933A
Authority
JP
Japan
Prior art keywords
org
denotes
group
coated
decomposition reaction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP18175480A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6339048B2 (enrdf_load_stackoverflow
Inventor
Kaname Miyazawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Suwa Seikosha KK
Original Assignee
Seiko Epson Corp
Suwa Seikosha KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp, Suwa Seikosha KK filed Critical Seiko Epson Corp
Priority to JP18175480A priority Critical patent/JPS57104933A/ja
Publication of JPS57104933A publication Critical patent/JPS57104933A/ja
Publication of JPS6339048B2 publication Critical patent/JPS6339048B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP18175480A 1980-12-22 1980-12-22 See-through glass mask Granted JPS57104933A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18175480A JPS57104933A (en) 1980-12-22 1980-12-22 See-through glass mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18175480A JPS57104933A (en) 1980-12-22 1980-12-22 See-through glass mask

Publications (2)

Publication Number Publication Date
JPS57104933A true JPS57104933A (en) 1982-06-30
JPS6339048B2 JPS6339048B2 (enrdf_load_stackoverflow) 1988-08-03

Family

ID=16106297

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18175480A Granted JPS57104933A (en) 1980-12-22 1980-12-22 See-through glass mask

Country Status (1)

Country Link
JP (1) JPS57104933A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6486144A (en) * 1987-09-29 1989-03-30 Fujitsu Ltd Method for patterning resist
JPH01121856A (ja) * 1987-11-06 1989-05-15 Fujitsu Ltd シースルーマスク

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6486144A (en) * 1987-09-29 1989-03-30 Fujitsu Ltd Method for patterning resist
JPH01121856A (ja) * 1987-11-06 1989-05-15 Fujitsu Ltd シースルーマスク

Also Published As

Publication number Publication date
JPS6339048B2 (enrdf_load_stackoverflow) 1988-08-03

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