JPS6486144A - Method for patterning resist - Google Patents
Method for patterning resistInfo
- Publication number
- JPS6486144A JPS6486144A JP24470587A JP24470587A JPS6486144A JP S6486144 A JPS6486144 A JP S6486144A JP 24470587 A JP24470587 A JP 24470587A JP 24470587 A JP24470587 A JP 24470587A JP S6486144 A JPS6486144 A JP S6486144A
- Authority
- JP
- Japan
- Prior art keywords
- mask
- resist
- exposed part
- usage
- resolution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
PURPOSE:To improve the usage and resolution of general resist by using masks which have different transmission wavelength for an exposed part and an unexposed part. CONSTITUTION:This method consists of a light source 1 which has a wide light emission spectrum, a mask 2, a mask substrate 21 made of synthetic quartz, a mask film 22 formed by adhering materials with transmission wavelength bands on the mask substrate 21 at the unexposed part A and exposed part B, a positive resist film 3, and a wafer 4. Then this mask is used to form lines (a) and spaces (b) on the positive resist film 3. Therefore, the fusion difficulty increases at the unexposed part and the fusibility is increased at the exposed part. Consequently, the resist itself is not improved, so the usage and resolution of the general resist are improved.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP24470587A JP2506385B2 (en) | 1987-09-29 | 1987-09-29 | Resist patterning method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP24470587A JP2506385B2 (en) | 1987-09-29 | 1987-09-29 | Resist patterning method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6486144A true JPS6486144A (en) | 1989-03-30 |
JP2506385B2 JP2506385B2 (en) | 1996-06-12 |
Family
ID=17122700
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP24470587A Expired - Lifetime JP2506385B2 (en) | 1987-09-29 | 1987-09-29 | Resist patterning method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2506385B2 (en) |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4916380A (en) * | 1972-05-22 | 1974-02-13 | ||
JPS57104933A (en) * | 1980-12-22 | 1982-06-30 | Seiko Epson Corp | See-through glass mask |
-
1987
- 1987-09-29 JP JP24470587A patent/JP2506385B2/en not_active Expired - Lifetime
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4916380A (en) * | 1972-05-22 | 1974-02-13 | ||
JPS57104933A (en) * | 1980-12-22 | 1982-06-30 | Seiko Epson Corp | See-through glass mask |
Also Published As
Publication number | Publication date |
---|---|
JP2506385B2 (en) | 1996-06-12 |
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