JPS57104264A - Semiconductor memory cell - Google Patents

Semiconductor memory cell

Info

Publication number
JPS57104264A
JPS57104264A JP55180952A JP18095280A JPS57104264A JP S57104264 A JPS57104264 A JP S57104264A JP 55180952 A JP55180952 A JP 55180952A JP 18095280 A JP18095280 A JP 18095280A JP S57104264 A JPS57104264 A JP S57104264A
Authority
JP
Japan
Prior art keywords
gate
conductor layer
insulating film
erasing
insulating films
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP55180952A
Other languages
English (en)
Other versions
JPS6331114B2 (ja
Inventor
Fujio Masuoka
Hisakazu Iizuka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP55180952A priority Critical patent/JPS57104264A/ja
Priority to US06/320,936 priority patent/US4531203A/en
Publication of JPS57104264A publication Critical patent/JPS57104264A/ja
Priority to US06/721,431 priority patent/US4612212A/en
Publication of JPS6331114B2 publication Critical patent/JPS6331114B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/78Field effect transistors with field effect produced by an insulated gate
    • H01L29/788Field effect transistors with field effect produced by an insulated gate with floating gate
    • H01L29/7881Programmable transistors with only two possible levels of programmation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/78Field effect transistors with field effect produced by an insulated gate
    • H01L29/788Field effect transistors with field effect produced by an insulated gate with floating gate
    • H01L29/7881Programmable transistors with only two possible levels of programmation
    • H01L29/7884Programmable transistors with only two possible levels of programmation charging by hot carrier injection
    • H01L29/7885Hot carrier injection from the channel

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Semiconductor Memories (AREA)
  • Non-Volatile Memory (AREA)
JP55180952A 1980-12-20 1980-12-20 Semiconductor memory cell Granted JPS57104264A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP55180952A JPS57104264A (en) 1980-12-20 1980-12-20 Semiconductor memory cell
US06/320,936 US4531203A (en) 1980-12-20 1981-11-13 Semiconductor memory device and method for manufacturing the same
US06/721,431 US4612212A (en) 1980-12-20 1985-04-09 Method for manufacturing E2 PROM

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55180952A JPS57104264A (en) 1980-12-20 1980-12-20 Semiconductor memory cell

Publications (2)

Publication Number Publication Date
JPS57104264A true JPS57104264A (en) 1982-06-29
JPS6331114B2 JPS6331114B2 (ja) 1988-06-22

Family

ID=16092139

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55180952A Granted JPS57104264A (en) 1980-12-20 1980-12-20 Semiconductor memory cell

Country Status (1)

Country Link
JP (1) JPS57104264A (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05270189A (ja) * 1992-03-26 1993-10-19 Matsushita Electric Works Ltd クリップ

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102591601B1 (ko) * 2021-02-25 2023-10-20 주식회사 에스오에스랩 센서를 이용한 보안 장치의 동작 방법
KR102591598B1 (ko) * 2021-02-25 2023-10-20 주식회사 에스오에스랩 센서를 이용한 보안 장치의 동작 방법
KR102678598B1 (ko) * 2023-11-09 2024-06-27 주식회사 위쥬테크 라이다를 이용한 차량 감지 장치

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05270189A (ja) * 1992-03-26 1993-10-19 Matsushita Electric Works Ltd クリップ

Also Published As

Publication number Publication date
JPS6331114B2 (ja) 1988-06-22

Similar Documents

Publication Publication Date Title
JPS55156371A (en) Non-volatile semiconductor memory device
JPS5728364A (en) Semiconductor memory device
JPS5743470A (en) Semiconductor device
JPS57141969A (en) Nonvolatile semiconductor memory
JPS5718356A (en) Semiconductor memory storage
TW324859B (en) Manufacturing method of non-volatile semiconductor memory with erasing gate
JPS57104264A (en) Semiconductor memory cell
JPS5791561A (en) Semiconductor non-volatile memory device and manufacture therefor
JPS5519820A (en) Semiconductor device
JPS5787177A (en) Semiconductor memory device
JPS55157253A (en) Mos semiconductor integrated circuit
JPS57104262A (en) Manufacture of semiconductor memory storage
JPS57176757A (en) Semiconductor device
JPS56104473A (en) Semiconductor memory device and manufacture thereof
JPS6433961A (en) Mos composite memory device
JPS55111173A (en) Semiconductor memory device
JPS56150860A (en) Manufacture of semiconductor memory device
JPS57160163A (en) Nonvolatile semiconductor memory
JPS55153375A (en) Non-volatile semiconductor memory device
JPS56104462A (en) Semiconductor memory device
JPS57104263A (en) Semiconductor memory storage
JPS5736868A (en) Manufacture of nonvolatile semiconductor memory device
JPS57162371A (en) Mos semiconductor memory device
JPS577967A (en) Structure of mos transistor and manufacture thereof
JPS55102274A (en) Insulated gate field effect transistor