JPS57102044A - Insulating isolation substrate - Google Patents
Insulating isolation substrateInfo
- Publication number
- JPS57102044A JPS57102044A JP55177245A JP17724580A JPS57102044A JP S57102044 A JPS57102044 A JP S57102044A JP 55177245 A JP55177245 A JP 55177245A JP 17724580 A JP17724580 A JP 17724580A JP S57102044 A JPS57102044 A JP S57102044A
- Authority
- JP
- Japan
- Prior art keywords
- polycrystalline silicon
- silicon thin
- final multilayer
- denatured
- invasion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000002955 isolation Methods 0.000 title abstract 3
- 239000000758 substrate Substances 0.000 title abstract 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 abstract 5
- 230000002265 prevention Effects 0.000 abstract 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract 2
- 239000013078 crystal Substances 0.000 abstract 2
- 230000009545 invasion Effects 0.000 abstract 2
- 238000000034 method Methods 0.000 abstract 2
- 229910052760 oxygen Inorganic materials 0.000 abstract 2
- 239000001301 oxygen Substances 0.000 abstract 2
- 238000006243 chemical reaction Methods 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 abstract 1
- 239000007858 starting material Substances 0.000 abstract 1
- 239000012808 vapor phase Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
- H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
- H01L21/76297—Dielectric isolation using EPIC techniques, i.e. epitaxial passivated integrated circuit
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Bipolar Transistors (AREA)
- Element Separation (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55177245A JPS57102044A (en) | 1980-12-17 | 1980-12-17 | Insulating isolation substrate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55177245A JPS57102044A (en) | 1980-12-17 | 1980-12-17 | Insulating isolation substrate |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57102044A true JPS57102044A (en) | 1982-06-24 |
JPH0137851B2 JPH0137851B2 (enrdf_load_stackoverflow) | 1989-08-09 |
Family
ID=16027684
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP55177245A Granted JPS57102044A (en) | 1980-12-17 | 1980-12-17 | Insulating isolation substrate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57102044A (enrdf_load_stackoverflow) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5081061A (en) * | 1990-02-23 | 1992-01-14 | Harris Corporation | Manufacturing ultra-thin dielectrically isolated wafers |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6446347U (enrdf_load_stackoverflow) * | 1987-09-18 | 1989-03-22 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS51131280A (en) * | 1975-05-12 | 1976-11-15 | Hitachi Ltd | Dielectric insulation separation base manufacturing process |
-
1980
- 1980-12-17 JP JP55177245A patent/JPS57102044A/ja active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS51131280A (en) * | 1975-05-12 | 1976-11-15 | Hitachi Ltd | Dielectric insulation separation base manufacturing process |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5081061A (en) * | 1990-02-23 | 1992-01-14 | Harris Corporation | Manufacturing ultra-thin dielectrically isolated wafers |
Also Published As
Publication number | Publication date |
---|---|
JPH0137851B2 (enrdf_load_stackoverflow) | 1989-08-09 |
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