JPS57100940A - Substrate coated with silicon oxide having high durability - Google Patents
Substrate coated with silicon oxide having high durabilityInfo
- Publication number
- JPS57100940A JPS57100940A JP17313580A JP17313580A JPS57100940A JP S57100940 A JPS57100940 A JP S57100940A JP 17313580 A JP17313580 A JP 17313580A JP 17313580 A JP17313580 A JP 17313580A JP S57100940 A JPS57100940 A JP S57100940A
- Authority
- JP
- Japan
- Prior art keywords
- silicon oxide
- coating film
- oxide coating
- substrate
- substrate coated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
PURPOSE: To obtain a substrate coated with silicon oxide having high stability against saline water and high-temperature steam, by forming a silicon oxide coating film containing a specific metal oxide, on the surface of a substrate.
CONSTITUTION: An alcohol solution containing 5W30wt% organic silicon compound (e.g. ethyl silicate) is added with one or more compounds of metals selected from Al, Ga, In, Y, La, and Ce in an amount of 1W30mol% (as oxide), and the pH of the mixture is adjusted to 2W6 with an acid such as hydrochloric acid, acetic acid, etc. to obtain a film-forming solution. The solution is applied to the surface of a substrate made of glass, ceramic, plastic, etc., dried by heating, and baked in an oxidative atmosphere or in air at 300W650°C to obtain a silicon oxide coating film having a thickness of 500W2,000Å. The silicon oxide coating film thus obtained is resistant to the formation of spot defects and fine cracks even by the outdoor exposure.
COPYRIGHT: (C)1982,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17313580A JPS57100940A (en) | 1980-12-10 | 1980-12-10 | Substrate coated with silicon oxide having high durability |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17313580A JPS57100940A (en) | 1980-12-10 | 1980-12-10 | Substrate coated with silicon oxide having high durability |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS57100940A true JPS57100940A (en) | 1982-06-23 |
Family
ID=15954762
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP17313580A Pending JPS57100940A (en) | 1980-12-10 | 1980-12-10 | Substrate coated with silicon oxide having high durability |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57100940A (en) |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6435835A (en) * | 1987-07-30 | 1989-02-06 | Nec Corp | Glare shield type cathode-ray tube |
JPH02178601A (en) * | 1988-12-28 | 1990-07-11 | Toshiba Glass Co Ltd | Optical glass |
US5110637A (en) * | 1988-03-03 | 1992-05-05 | Asahi Glass Company Ltd. | Amorphous oxide film and article having such film thereon |
EP0486475A2 (en) * | 1988-03-03 | 1992-05-20 | Asahi Glass Company Ltd. | Amorphous oxide film and article having such film thereon |
US5354446A (en) * | 1988-03-03 | 1994-10-11 | Asahi Glass Company Ltd. | Ceramic rotatable magnetron sputtering cathode target and process for its production |
EP1350772A1 (en) * | 2002-04-05 | 2003-10-08 | Murakami Corporation | Barrier layer for photocatalytically active composite material |
CN103073195A (en) * | 2013-02-04 | 2013-05-01 | 山东理工大学 | Method for preparing super-hydrophobicity SiO2 film by utilizing water glass |
KR20140026539A (en) * | 2011-05-30 | 2014-03-05 | 쌩-고벵 글래스 프랑스 | Alkali-barrier layer |
DE102013009881B3 (en) * | 2013-06-13 | 2014-12-11 | Ferro Gmbh | Process for the preparation of an SiO 2 antireflective coating, SiO 2 antireflective coated substrate and its use |
CN105314871A (en) * | 2015-11-27 | 2016-02-10 | 宁波大学 | Rare earth ion doped YCl3 microcrystalline glass and preparation method thereof |
CN111302834A (en) * | 2020-04-15 | 2020-06-19 | 湖南省美程陶瓷科技有限公司 | Microwave magnetron insulating ceramic ring |
-
1980
- 1980-12-10 JP JP17313580A patent/JPS57100940A/en active Pending
Cited By (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6435835A (en) * | 1987-07-30 | 1989-02-06 | Nec Corp | Glare shield type cathode-ray tube |
US5110637A (en) * | 1988-03-03 | 1992-05-05 | Asahi Glass Company Ltd. | Amorphous oxide film and article having such film thereon |
EP0486475A2 (en) * | 1988-03-03 | 1992-05-20 | Asahi Glass Company Ltd. | Amorphous oxide film and article having such film thereon |
US5354446A (en) * | 1988-03-03 | 1994-10-11 | Asahi Glass Company Ltd. | Ceramic rotatable magnetron sputtering cathode target and process for its production |
US5399435A (en) * | 1988-03-03 | 1995-03-21 | Asahi Glass Company Ltd. | Amorphous oxide film and article having such film thereon |
JPH02178601A (en) * | 1988-12-28 | 1990-07-11 | Toshiba Glass Co Ltd | Optical glass |
EP1350772A1 (en) * | 2002-04-05 | 2003-10-08 | Murakami Corporation | Barrier layer for photocatalytically active composite material |
KR20140026539A (en) * | 2011-05-30 | 2014-03-05 | 쌩-고벵 글래스 프랑스 | Alkali-barrier layer |
JP2014516909A (en) * | 2011-05-30 | 2014-07-17 | サン−ゴバン グラス フランス | Alkaline barrier layer |
CN103073195A (en) * | 2013-02-04 | 2013-05-01 | 山东理工大学 | Method for preparing super-hydrophobicity SiO2 film by utilizing water glass |
CN103073195B (en) * | 2013-02-04 | 2015-03-25 | 山东理工大学 | Method for preparing super-hydrophobicity SiO2 film by utilizing water glass |
DE102013009881B3 (en) * | 2013-06-13 | 2014-12-11 | Ferro Gmbh | Process for the preparation of an SiO 2 antireflective coating, SiO 2 antireflective coated substrate and its use |
CN105314871A (en) * | 2015-11-27 | 2016-02-10 | 宁波大学 | Rare earth ion doped YCl3 microcrystalline glass and preparation method thereof |
CN111302834A (en) * | 2020-04-15 | 2020-06-19 | 湖南省美程陶瓷科技有限公司 | Microwave magnetron insulating ceramic ring |
CN111302834B (en) * | 2020-04-15 | 2020-10-23 | 湖南省美程陶瓷科技有限公司 | Microwave magnetron insulating ceramic ring |
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