JPS57100940A - Substrate coated with silicon oxide having high durability - Google Patents

Substrate coated with silicon oxide having high durability

Info

Publication number
JPS57100940A
JPS57100940A JP17313580A JP17313580A JPS57100940A JP S57100940 A JPS57100940 A JP S57100940A JP 17313580 A JP17313580 A JP 17313580A JP 17313580 A JP17313580 A JP 17313580A JP S57100940 A JPS57100940 A JP S57100940A
Authority
JP
Japan
Prior art keywords
silicon oxide
coating film
oxide coating
substrate
substrate coated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17313580A
Other languages
Japanese (ja)
Inventor
Mamoru Mizuhashi
Noriyuki Iida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Inc
Murakami Kaimeido Co Ltd
Original Assignee
Asahi Glass Co Ltd
Murakami Kaimeido Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd, Murakami Kaimeido Co Ltd filed Critical Asahi Glass Co Ltd
Priority to JP17313580A priority Critical patent/JPS57100940A/en
Publication of JPS57100940A publication Critical patent/JPS57100940A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23Oxides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
  • Surface Treatment Of Glass (AREA)

Abstract

PURPOSE: To obtain a substrate coated with silicon oxide having high stability against saline water and high-temperature steam, by forming a silicon oxide coating film containing a specific metal oxide, on the surface of a substrate.
CONSTITUTION: An alcohol solution containing 5W30wt% organic silicon compound (e.g. ethyl silicate) is added with one or more compounds of metals selected from Al, Ga, In, Y, La, and Ce in an amount of 1W30mol% (as oxide), and the pH of the mixture is adjusted to 2W6 with an acid such as hydrochloric acid, acetic acid, etc. to obtain a film-forming solution. The solution is applied to the surface of a substrate made of glass, ceramic, plastic, etc., dried by heating, and baked in an oxidative atmosphere or in air at 300W650°C to obtain a silicon oxide coating film having a thickness of 500W2,000Å. The silicon oxide coating film thus obtained is resistant to the formation of spot defects and fine cracks even by the outdoor exposure.
COPYRIGHT: (C)1982,JPO&Japio
JP17313580A 1980-12-10 1980-12-10 Substrate coated with silicon oxide having high durability Pending JPS57100940A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17313580A JPS57100940A (en) 1980-12-10 1980-12-10 Substrate coated with silicon oxide having high durability

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17313580A JPS57100940A (en) 1980-12-10 1980-12-10 Substrate coated with silicon oxide having high durability

Publications (1)

Publication Number Publication Date
JPS57100940A true JPS57100940A (en) 1982-06-23

Family

ID=15954762

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17313580A Pending JPS57100940A (en) 1980-12-10 1980-12-10 Substrate coated with silicon oxide having high durability

Country Status (1)

Country Link
JP (1) JPS57100940A (en)

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6435835A (en) * 1987-07-30 1989-02-06 Nec Corp Glare shield type cathode-ray tube
JPH02178601A (en) * 1988-12-28 1990-07-11 Toshiba Glass Co Ltd Optical glass
US5110637A (en) * 1988-03-03 1992-05-05 Asahi Glass Company Ltd. Amorphous oxide film and article having such film thereon
EP0486475A2 (en) * 1988-03-03 1992-05-20 Asahi Glass Company Ltd. Amorphous oxide film and article having such film thereon
US5354446A (en) * 1988-03-03 1994-10-11 Asahi Glass Company Ltd. Ceramic rotatable magnetron sputtering cathode target and process for its production
EP1350772A1 (en) * 2002-04-05 2003-10-08 Murakami Corporation Barrier layer for photocatalytically active composite material
CN103073195A (en) * 2013-02-04 2013-05-01 山东理工大学 Method for preparing super-hydrophobicity SiO2 film by utilizing water glass
KR20140026539A (en) * 2011-05-30 2014-03-05 쌩-고벵 글래스 프랑스 Alkali-barrier layer
DE102013009881B3 (en) * 2013-06-13 2014-12-11 Ferro Gmbh Process for the preparation of an SiO 2 antireflective coating, SiO 2 antireflective coated substrate and its use
CN105314871A (en) * 2015-11-27 2016-02-10 宁波大学 Rare earth ion doped YCl3 microcrystalline glass and preparation method thereof
CN111302834A (en) * 2020-04-15 2020-06-19 湖南省美程陶瓷科技有限公司 Microwave magnetron insulating ceramic ring

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6435835A (en) * 1987-07-30 1989-02-06 Nec Corp Glare shield type cathode-ray tube
US5110637A (en) * 1988-03-03 1992-05-05 Asahi Glass Company Ltd. Amorphous oxide film and article having such film thereon
EP0486475A2 (en) * 1988-03-03 1992-05-20 Asahi Glass Company Ltd. Amorphous oxide film and article having such film thereon
US5354446A (en) * 1988-03-03 1994-10-11 Asahi Glass Company Ltd. Ceramic rotatable magnetron sputtering cathode target and process for its production
US5399435A (en) * 1988-03-03 1995-03-21 Asahi Glass Company Ltd. Amorphous oxide film and article having such film thereon
JPH02178601A (en) * 1988-12-28 1990-07-11 Toshiba Glass Co Ltd Optical glass
EP1350772A1 (en) * 2002-04-05 2003-10-08 Murakami Corporation Barrier layer for photocatalytically active composite material
KR20140026539A (en) * 2011-05-30 2014-03-05 쌩-고벵 글래스 프랑스 Alkali-barrier layer
JP2014516909A (en) * 2011-05-30 2014-07-17 サン−ゴバン グラス フランス Alkaline barrier layer
CN103073195A (en) * 2013-02-04 2013-05-01 山东理工大学 Method for preparing super-hydrophobicity SiO2 film by utilizing water glass
CN103073195B (en) * 2013-02-04 2015-03-25 山东理工大学 Method for preparing super-hydrophobicity SiO2 film by utilizing water glass
DE102013009881B3 (en) * 2013-06-13 2014-12-11 Ferro Gmbh Process for the preparation of an SiO 2 antireflective coating, SiO 2 antireflective coated substrate and its use
CN105314871A (en) * 2015-11-27 2016-02-10 宁波大学 Rare earth ion doped YCl3 microcrystalline glass and preparation method thereof
CN111302834A (en) * 2020-04-15 2020-06-19 湖南省美程陶瓷科技有限公司 Microwave magnetron insulating ceramic ring
CN111302834B (en) * 2020-04-15 2020-10-23 湖南省美程陶瓷科技有限公司 Microwave magnetron insulating ceramic ring

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