JPS57100943A - Substrate coated with silicon oxide having excellent durability - Google Patents

Substrate coated with silicon oxide having excellent durability

Info

Publication number
JPS57100943A
JPS57100943A JP17313880A JP17313880A JPS57100943A JP S57100943 A JPS57100943 A JP S57100943A JP 17313880 A JP17313880 A JP 17313880A JP 17313880 A JP17313880 A JP 17313880A JP S57100943 A JPS57100943 A JP S57100943A
Authority
JP
Japan
Prior art keywords
silicon oxide
coating film
oxide coating
substrate coated
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17313880A
Other languages
Japanese (ja)
Inventor
Mamoru Mizuhashi
Noriyuki Iida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Inc
Murakami Kaimeido Co Ltd
Original Assignee
Asahi Glass Co Ltd
Murakami Kaimeido Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd, Murakami Kaimeido Co Ltd filed Critical Asahi Glass Co Ltd
Priority to JP17313880A priority Critical patent/JPS57100943A/en
Publication of JPS57100943A publication Critical patent/JPS57100943A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
  • Surface Treatment Of Glass (AREA)

Abstract

PURPOSE: To prepare the titled substrate coated with silicon oxide having high stability against saline water and high-temperature steam, by forming a silicon oxide coating film containing ZrO2 on the surface of a substrate.
CONSTITUTION: An alcohol solution containing 5W30wt% organic silicon compound (e.g. ethyl silicate) is added with a zirconium compound[e.g. ZrCl2, Zr(NO3)4, etc.]in an amount of 1W30mol% (as ZrO2), and the pH of the mixture is adjusted to 2W6 with an acid such as hydrochloric acid, acetic acid, etc. to obtain a film-forming solution. The solution is applied to the surface of a substrate made of glass, ceramic, plastic, etc., dried by heating, and baked in an oxidative atmosphere or in air at 300W650°C to obtain a silicon oxide coating film having a thickness of 500W2,000Å. The silicon oxide coating film thus obtained is resistant to the formation of spot defects and fine cracks even by the outdoor exposure.
COPYRIGHT: (C)1982,JPO&Japio
JP17313880A 1980-12-10 1980-12-10 Substrate coated with silicon oxide having excellent durability Pending JPS57100943A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17313880A JPS57100943A (en) 1980-12-10 1980-12-10 Substrate coated with silicon oxide having excellent durability

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17313880A JPS57100943A (en) 1980-12-10 1980-12-10 Substrate coated with silicon oxide having excellent durability

Publications (1)

Publication Number Publication Date
JPS57100943A true JPS57100943A (en) 1982-06-23

Family

ID=15954816

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17313880A Pending JPS57100943A (en) 1980-12-10 1980-12-10 Substrate coated with silicon oxide having excellent durability

Country Status (1)

Country Link
JP (1) JPS57100943A (en)

Cited By (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59102837A (en) * 1982-11-29 1984-06-14 Toshiba Ceramics Co Ltd Alkali-resistant molded article of fused quartz and its manufacture
JPS63195686A (en) * 1987-02-10 1988-08-12 触媒化成工業株式会社 Display device and manufacture thereof
WO1988006331A1 (en) * 1987-02-10 1988-08-25 Catalysts & Chemicals Industries Co., Ltd. Coating fluid for forming electroconductive coat
JPH01314163A (en) * 1988-06-14 1989-12-19 Asahi Glass Co Ltd Heat ray shielded glass
JPH02178601A (en) * 1988-12-28 1990-07-11 Toshiba Glass Co Ltd Optical glass
JPH0395725A (en) * 1989-09-08 1991-04-22 Nec Corp Magnetic memory medium
JPH03122031A (en) * 1988-10-21 1991-05-24 Asahi Glass Co Ltd Transparent body provided with protective film having scratch resistance
JPH03232745A (en) * 1989-08-01 1991-10-16 Asahi Glass Co Ltd Electrically conductive glass and production thereof
US5110637A (en) * 1988-03-03 1992-05-05 Asahi Glass Company Ltd. Amorphous oxide film and article having such film thereon
EP0486475A2 (en) * 1988-03-03 1992-05-20 Asahi Glass Company Ltd. Amorphous oxide film and article having such film thereon
US5354446A (en) * 1988-03-03 1994-10-11 Asahi Glass Company Ltd. Ceramic rotatable magnetron sputtering cathode target and process for its production
US5772862A (en) * 1988-03-03 1998-06-30 Asahi Glass Company Ltd. Film comprising silicon dioxide as the main component and method for its productiion
WO2005115741A1 (en) * 2004-05-28 2005-12-08 Ngk Insulators, Ltd. Method for forming film on zirconium-based metallic glass surface and zirconium-based metallic glass component
US7026039B2 (en) * 2002-05-23 2006-04-11 Saint-Gobain Ceramics & Plastics, Inc. Zircon/zirconia mix for refractory coatings and inks
CN102153291A (en) * 2010-12-14 2011-08-17 吉林大学 Method for preparing antireflection antifogging wear-resistant coating by non-posterior chemical modification method
WO2014103768A1 (en) * 2012-12-27 2014-07-03 旭硝子株式会社 Laminate
DE102013009881B3 (en) * 2013-06-13 2014-12-11 Ferro Gmbh Process for the preparation of an SiO 2 antireflective coating, SiO 2 antireflective coated substrate and its use

Cited By (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59102837A (en) * 1982-11-29 1984-06-14 Toshiba Ceramics Co Ltd Alkali-resistant molded article of fused quartz and its manufacture
JPS63195686A (en) * 1987-02-10 1988-08-12 触媒化成工業株式会社 Display device and manufacture thereof
WO1988006331A1 (en) * 1987-02-10 1988-08-25 Catalysts & Chemicals Industries Co., Ltd. Coating fluid for forming electroconductive coat
JPH0465384B2 (en) * 1987-02-10 1992-10-19 Catalysts & Chem Ind Co
EP0486475A2 (en) * 1988-03-03 1992-05-20 Asahi Glass Company Ltd. Amorphous oxide film and article having such film thereon
US5772862A (en) * 1988-03-03 1998-06-30 Asahi Glass Company Ltd. Film comprising silicon dioxide as the main component and method for its productiion
US5399435A (en) * 1988-03-03 1995-03-21 Asahi Glass Company Ltd. Amorphous oxide film and article having such film thereon
US5354446A (en) * 1988-03-03 1994-10-11 Asahi Glass Company Ltd. Ceramic rotatable magnetron sputtering cathode target and process for its production
US5110637A (en) * 1988-03-03 1992-05-05 Asahi Glass Company Ltd. Amorphous oxide film and article having such film thereon
JPH01314163A (en) * 1988-06-14 1989-12-19 Asahi Glass Co Ltd Heat ray shielded glass
JPH03122031A (en) * 1988-10-21 1991-05-24 Asahi Glass Co Ltd Transparent body provided with protective film having scratch resistance
JPH02178601A (en) * 1988-12-28 1990-07-11 Toshiba Glass Co Ltd Optical glass
JPH03232745A (en) * 1989-08-01 1991-10-16 Asahi Glass Co Ltd Electrically conductive glass and production thereof
JPH0780692B2 (en) * 1989-08-01 1995-08-30 旭硝子株式会社 Conductive glass and manufacturing method thereof
JPH0395725A (en) * 1989-09-08 1991-04-22 Nec Corp Magnetic memory medium
US7026039B2 (en) * 2002-05-23 2006-04-11 Saint-Gobain Ceramics & Plastics, Inc. Zircon/zirconia mix for refractory coatings and inks
USRE40301E1 (en) * 2002-05-23 2008-05-06 Saint-Gobain Ceramics & Plastics, Inc. Zircon/zirconia mix for refractory coatings and inks
WO2005115741A1 (en) * 2004-05-28 2005-12-08 Ngk Insulators, Ltd. Method for forming film on zirconium-based metallic glass surface and zirconium-based metallic glass component
CN102153291A (en) * 2010-12-14 2011-08-17 吉林大学 Method for preparing antireflection antifogging wear-resistant coating by non-posterior chemical modification method
WO2014103768A1 (en) * 2012-12-27 2014-07-03 旭硝子株式会社 Laminate
DE102013009881B3 (en) * 2013-06-13 2014-12-11 Ferro Gmbh Process for the preparation of an SiO 2 antireflective coating, SiO 2 antireflective coated substrate and its use

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