JPS5696860A - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- JPS5696860A JPS5696860A JP17174879A JP17174879A JPS5696860A JP S5696860 A JPS5696860 A JP S5696860A JP 17174879 A JP17174879 A JP 17174879A JP 17174879 A JP17174879 A JP 17174879A JP S5696860 A JPS5696860 A JP S5696860A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- amorphous
- monocrystal
- emitter
- injection efficiency
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title abstract 2
- 229910021417 amorphous silicon Inorganic materials 0.000 abstract 3
- 238000002347 injection Methods 0.000 abstract 3
- 239000007924 injection Substances 0.000 abstract 3
- 239000000758 substrate Substances 0.000 abstract 3
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 abstract 1
- 239000000203 mixture Substances 0.000 abstract 1
- 230000006798 recombination Effects 0.000 abstract 1
- 238000005215 recombination Methods 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/40—Crystalline structures
Landscapes
- Bipolar Transistors (AREA)
- Recrystallisation Techniques (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17174879A JPS5696860A (en) | 1979-12-29 | 1979-12-29 | Semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17174879A JPS5696860A (en) | 1979-12-29 | 1979-12-29 | Semiconductor device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5696860A true JPS5696860A (en) | 1981-08-05 |
JPS6337509B2 JPS6337509B2 (enrdf_load_stackoverflow) | 1988-07-26 |
Family
ID=15928952
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP17174879A Granted JPS5696860A (en) | 1979-12-29 | 1979-12-29 | Semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5696860A (enrdf_load_stackoverflow) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61180480A (ja) * | 1984-10-02 | 1986-08-13 | イメツク(インタ−・ユニヴア−スイタリア・マイクロ−エレクトロニカ・セントラム)ヴイ・ズイ−・ダブリユ | バイポ−ラ・ヘテロ接合トランジスタ−及びその製造方法 |
JPS6351673A (ja) * | 1985-03-23 | 1988-03-04 | エステイ−シ− ピ−エルシ− | バイポ−ラトランジスタの製造方法 |
-
1979
- 1979-12-29 JP JP17174879A patent/JPS5696860A/ja active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61180480A (ja) * | 1984-10-02 | 1986-08-13 | イメツク(インタ−・ユニヴア−スイタリア・マイクロ−エレクトロニカ・セントラム)ヴイ・ズイ−・ダブリユ | バイポ−ラ・ヘテロ接合トランジスタ−及びその製造方法 |
JPS6351673A (ja) * | 1985-03-23 | 1988-03-04 | エステイ−シ− ピ−エルシ− | バイポ−ラトランジスタの製造方法 |
Also Published As
Publication number | Publication date |
---|---|
JPS6337509B2 (enrdf_load_stackoverflow) | 1988-07-26 |
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