JPS5683059A - Horizontal bipolar transistor - Google Patents

Horizontal bipolar transistor

Info

Publication number
JPS5683059A
JPS5683059A JP16012779A JP16012779A JPS5683059A JP S5683059 A JPS5683059 A JP S5683059A JP 16012779 A JP16012779 A JP 16012779A JP 16012779 A JP16012779 A JP 16012779A JP S5683059 A JPS5683059 A JP S5683059A
Authority
JP
Japan
Prior art keywords
concentration
impurities
section
digging
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16012779A
Other languages
Japanese (ja)
Inventor
Eiichi Iwanami
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Instruments Inc
Original Assignee
Seiko Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Instruments Inc filed Critical Seiko Instruments Inc
Priority to JP16012779A priority Critical patent/JPS5683059A/en
Publication of JPS5683059A publication Critical patent/JPS5683059A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/70Bipolar devices
    • H01L29/72Transistor-type devices, i.e. able to continuously respond to applied control signals
    • H01L29/73Bipolar junction transistors
    • H01L29/735Lateral transistors

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Bipolar Transistors (AREA)
  • Bipolar Integrated Circuits (AREA)

Abstract

PURPOSE:To obtain a low saturated voltage characteristic by a method wherein a digging-in section is formed to a low impurity concentration epitaxial growth layer, and horizontal transistors are made up at a bottom section of the digging-in section, the concentration of impurities thereof is increased by means of auto-doping from a high impurity concentration substrate. CONSTITUTION:An epitaxial layer 2 having the concentration of impurities such as 3X10<13>atom/cm<3> is grown on an N<+> type semiconductor substrate 1 having the concentration of impurities such as 5X10<18>atom/cm<3>. A surface of the silicon substrate is etched to form a digging-in section 11. In the distribution of the concentration of impurities in the epitaxial layer 2 at that time, the nearer the impurities approach to an epitaxial interface the higher the concentration of the impurities becomes by auto-doping and out-diffusion from the N<+> type substrate 1 in case of growth. Horizontal transistors are formed at a bottom section of the digging-in section in the substrate treated in this manner so that the concentration of the impurities of the epitaxial layer forming junctions with an emitter 6 and one section of a collector 7 reaches 1X10<15>atom/cm<3> or more.
JP16012779A 1979-12-10 1979-12-10 Horizontal bipolar transistor Pending JPS5683059A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16012779A JPS5683059A (en) 1979-12-10 1979-12-10 Horizontal bipolar transistor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16012779A JPS5683059A (en) 1979-12-10 1979-12-10 Horizontal bipolar transistor

Publications (1)

Publication Number Publication Date
JPS5683059A true JPS5683059A (en) 1981-07-07

Family

ID=15708445

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16012779A Pending JPS5683059A (en) 1979-12-10 1979-12-10 Horizontal bipolar transistor

Country Status (1)

Country Link
JP (1) JPS5683059A (en)

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