JPS5694353A - Micropattern forming method - Google Patents

Micropattern forming method

Info

Publication number
JPS5694353A
JPS5694353A JP17101379A JP17101379A JPS5694353A JP S5694353 A JPS5694353 A JP S5694353A JP 17101379 A JP17101379 A JP 17101379A JP 17101379 A JP17101379 A JP 17101379A JP S5694353 A JPS5694353 A JP S5694353A
Authority
JP
Japan
Prior art keywords
layer
contact hole
wiring pattern
resist
resists
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP17101379A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6346983B2 (cs
Inventor
Hiroshi Tokunaga
Kenji Sugishima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP17101379A priority Critical patent/JPS5694353A/ja
Publication of JPS5694353A publication Critical patent/JPS5694353A/ja
Publication of JPS6346983B2 publication Critical patent/JPS6346983B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
JP17101379A 1979-12-28 1979-12-28 Micropattern forming method Granted JPS5694353A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17101379A JPS5694353A (en) 1979-12-28 1979-12-28 Micropattern forming method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17101379A JPS5694353A (en) 1979-12-28 1979-12-28 Micropattern forming method

Publications (2)

Publication Number Publication Date
JPS5694353A true JPS5694353A (en) 1981-07-30
JPS6346983B2 JPS6346983B2 (cs) 1988-09-20

Family

ID=15915472

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17101379A Granted JPS5694353A (en) 1979-12-28 1979-12-28 Micropattern forming method

Country Status (1)

Country Link
JP (1) JPS5694353A (cs)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6191948A (ja) * 1984-10-12 1986-05-10 Nec Corp 半導体装置の製造方法
JPS63316055A (ja) * 1987-06-19 1988-12-23 Toshiba Corp 半導体装置の製造方法
JPH01194334A (ja) * 1988-01-28 1989-08-04 Nec Corp 半導体集積回路の製造方法
US7354699B2 (en) 2001-11-06 2008-04-08 Hitachi Metals, Ltd. Method for producing alignment mark
JP2012208350A (ja) * 2011-03-30 2012-10-25 Lapis Semiconductor Co Ltd レジストパターンの形成方法、立体構造の製造方法、及び半導体装置の製造方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51108778A (en) * 1975-03-20 1976-09-27 Fujitsu Ltd Handotaisochino seizohoho
JPS5492801A (en) * 1977-12-30 1979-07-23 Ibm Photolithographic method

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51108778A (en) * 1975-03-20 1976-09-27 Fujitsu Ltd Handotaisochino seizohoho
JPS5492801A (en) * 1977-12-30 1979-07-23 Ibm Photolithographic method

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6191948A (ja) * 1984-10-12 1986-05-10 Nec Corp 半導体装置の製造方法
JPS63316055A (ja) * 1987-06-19 1988-12-23 Toshiba Corp 半導体装置の製造方法
JPH01194334A (ja) * 1988-01-28 1989-08-04 Nec Corp 半導体集積回路の製造方法
US7354699B2 (en) 2001-11-06 2008-04-08 Hitachi Metals, Ltd. Method for producing alignment mark
JP2012208350A (ja) * 2011-03-30 2012-10-25 Lapis Semiconductor Co Ltd レジストパターンの形成方法、立体構造の製造方法、及び半導体装置の製造方法

Also Published As

Publication number Publication date
JPS6346983B2 (cs) 1988-09-20

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