JPS5694350A - Method for correcting white spot defect of photomask - Google Patents

Method for correcting white spot defect of photomask

Info

Publication number
JPS5694350A
JPS5694350A JP17029179A JP17029179A JPS5694350A JP S5694350 A JPS5694350 A JP S5694350A JP 17029179 A JP17029179 A JP 17029179A JP 17029179 A JP17029179 A JP 17029179A JP S5694350 A JPS5694350 A JP S5694350A
Authority
JP
Japan
Prior art keywords
photomask
irradiation
light quantity
information
defects
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP17029179A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6140103B2 (enrdf_load_stackoverflow
Inventor
Takeoki Miyauchi
Katsuro Mizukoshi
Mikio Hongo
Masaaki Okunaka
Masao Mitani
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP17029179A priority Critical patent/JPS5694350A/ja
Publication of JPS5694350A publication Critical patent/JPS5694350A/ja
Publication of JPS6140103B2 publication Critical patent/JPS6140103B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72—Repair or correction of mask defects

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP17029179A 1979-12-28 1979-12-28 Method for correcting white spot defect of photomask Granted JPS5694350A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17029179A JPS5694350A (en) 1979-12-28 1979-12-28 Method for correcting white spot defect of photomask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17029179A JPS5694350A (en) 1979-12-28 1979-12-28 Method for correcting white spot defect of photomask

Publications (2)

Publication Number Publication Date
JPS5694350A true JPS5694350A (en) 1981-07-30
JPS6140103B2 JPS6140103B2 (enrdf_load_stackoverflow) 1986-09-08

Family

ID=15902225

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17029179A Granted JPS5694350A (en) 1979-12-28 1979-12-28 Method for correcting white spot defect of photomask

Country Status (1)

Country Link
JP (1) JPS5694350A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58138028A (ja) * 1982-02-12 1983-08-16 Hitachi Ltd フオトマスクの欠陥修正方法
JPS6157805U (enrdf_load_stackoverflow) * 1984-09-20 1986-04-18

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
APPLIED PHSICS LETTERS=1979 *
APPLIED PHYSICS LETTERS=1975 *

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58138028A (ja) * 1982-02-12 1983-08-16 Hitachi Ltd フオトマスクの欠陥修正方法
JPS6157805U (enrdf_load_stackoverflow) * 1984-09-20 1986-04-18

Also Published As

Publication number Publication date
JPS6140103B2 (enrdf_load_stackoverflow) 1986-09-08

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