JPS5694350A - Method for correcting white spot defect of photomask - Google Patents

Method for correcting white spot defect of photomask

Info

Publication number
JPS5694350A
JPS5694350A JP17029179A JP17029179A JPS5694350A JP S5694350 A JPS5694350 A JP S5694350A JP 17029179 A JP17029179 A JP 17029179A JP 17029179 A JP17029179 A JP 17029179A JP S5694350 A JPS5694350 A JP S5694350A
Authority
JP
Japan
Prior art keywords
photomask
irradiation
light quantity
information
defects
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP17029179A
Other languages
Japanese (ja)
Other versions
JPS6140103B2 (en
Inventor
Takeoki Miyauchi
Katsuro Mizukoshi
Mikio Hongo
Masaaki Okunaka
Masao Mitani
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP17029179A priority Critical patent/JPS5694350A/en
Publication of JPS5694350A publication Critical patent/JPS5694350A/en
Publication of JPS6140103B2 publication Critical patent/JPS6140103B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72—Repair or correction of mask defects

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

PURPOSE:To correct white defects with high precision for a short time, by measuring light quantity passing through a photomask to use it as information on irradiation stop in correcting the photomask defects by light irradiation. CONSTITUTION:Film 10 of a complex of a metal such as silver is formed on the upper surface of photomask 6 having white defects 11. Width of opening slit 3 is controlled, and laser beams 2 of visible or ultraviolet rays are projected to white defects 11. At that time the light quantity passing through photomask 6 from the beginning of irradiation is measured with photodetector 14, and that information is sent to controlling device 15. Device 15 uses the transmitted light quantity as a reference value, and stops irradiation when the quantity drops to the value less than a predetermined ratio. At that time, the information of the transmitted light quantity is stored recorder 16, and it is read out to use it for quality control of correction operation.
JP17029179A 1979-12-28 1979-12-28 Method for correcting white spot defect of photomask Granted JPS5694350A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17029179A JPS5694350A (en) 1979-12-28 1979-12-28 Method for correcting white spot defect of photomask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17029179A JPS5694350A (en) 1979-12-28 1979-12-28 Method for correcting white spot defect of photomask

Publications (2)

Publication Number Publication Date
JPS5694350A true JPS5694350A (en) 1981-07-30
JPS6140103B2 JPS6140103B2 (en) 1986-09-08

Family

ID=15902225

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17029179A Granted JPS5694350A (en) 1979-12-28 1979-12-28 Method for correcting white spot defect of photomask

Country Status (1)

Country Link
JP (1) JPS5694350A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58138028A (en) * 1982-02-12 1983-08-16 Hitachi Ltd Correcting method for photo mask defect
JPS6157805U (en) * 1984-09-20 1986-04-18

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
APPLIED PHSICS LETTERS=1979 *
APPLIED PHYSICS LETTERS=1975 *

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58138028A (en) * 1982-02-12 1983-08-16 Hitachi Ltd Correcting method for photo mask defect
JPS634173B2 (en) * 1982-02-12 1988-01-27 Hitachi Ltd
JPS6157805U (en) * 1984-09-20 1986-04-18

Also Published As

Publication number Publication date
JPS6140103B2 (en) 1986-09-08

Similar Documents

Publication Publication Date Title
JPS5616802A (en) Method and unit for measuring electro-optically dimension,position and form of object
DE3888876T2 (en) Exposure device.
DE3328578A1 (en) PROJECTION ADJUSTMENT
DE3378142D1 (en) Apparatus for controlling the write beam on an optical data recording system
DE1953656A1 (en) Exposure device
JPS5694350A (en) Method for correcting white spot defect of photomask
JPS5428131A (en) Control method for light amount of exposure for photographic printing
JPS5612633A (en) Laser recorder
JPS57159285A (en) Laser working device
JPS5572813A (en) Indication system for mask pattern correction point
JPS57159286A (en) Laser working device
JPS52119328A (en) Automatic control for amt. of exposure light in electrophotographic co pier
JPS5752807A (en) Device for measuring film thickness
GB1168965A (en) Method of Recording Information on a Photochromic Plate
DE3402177A1 (en) DEVICE FOR COPYING A MASK ON A SEMICONDUCTOR SUBSTRATE
SU62899A1 (en) Device for putting on the curve marks of certain values of the recorded value
SU145017A1 (en) A photovoltaic device for measuring switch devices to maintain an adjustable technological parameter depending on the driver
JPS561076A (en) Correcting method for light source fluctuation in pattern generator
JPS5669513A (en) Rotary encoder
JPS5732630A (en) Repair of defect on photomask
JPS5572804A (en) Pattern check system
JPS5587148A (en) Correction method for light shielding mask
JPS55116205A (en) Measuring apparatus for position of object
JPS56153325A (en) Automatic focus controller of camera
JPS5778648A (en) Optical recording method