JPS5572804A - Pattern check system - Google Patents

Pattern check system

Info

Publication number
JPS5572804A
JPS5572804A JP14687478A JP14687478A JPS5572804A JP S5572804 A JPS5572804 A JP S5572804A JP 14687478 A JP14687478 A JP 14687478A JP 14687478 A JP14687478 A JP 14687478A JP S5572804 A JPS5572804 A JP S5572804A
Authority
JP
Japan
Prior art keywords
light
projector
pattern
inspected
stage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14687478A
Other languages
Japanese (ja)
Inventor
Tadao Nakakuki
Taku Yoshida
Masayuki Oyama
Kikuo Mita
Masahito Nakajima
Katsumi Fujiwara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP14687478A priority Critical patent/JPS5572804A/en
Publication of JPS5572804A publication Critical patent/JPS5572804A/en
Pending legal-status Critical Current

Links

Landscapes

  • Length Measuring Devices By Optical Means (AREA)
  • Image Processing (AREA)
  • Image Analysis (AREA)

Abstract

PURPOSE: To make it possible to inspect a pattern by a simple constitution by irradiating an inspected material pattern with light from a projector while moving the light, constant pitch by constant pitch, and then by measuring the reflected light or a quantity of penetrating light.
CONSTITUTION: Laser light from light source 1 reaches light projector 5 by way of lenses 2 and 3 and mirror 4. Over projector 5, a shutter is provided which allows the light to pass for constant time and is controlled by circuit 9. Under projector 5, light irradiation window 13 which irradiates an inspected material pattern with the light is provided and inspected sample 7 is fixed on stage 6. Stage 6 moves by a fixed pitch by feed mechanism 11. On the reverse of sample 7, photo detector 8 is arranged which receives the penetrating light from projector 5 and then sends it output to decision circuit 12, where a decision on a defect of the pattern is made.
COPYRIGHT: (C)1980,JPO&Japio
JP14687478A 1978-11-28 1978-11-28 Pattern check system Pending JPS5572804A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14687478A JPS5572804A (en) 1978-11-28 1978-11-28 Pattern check system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14687478A JPS5572804A (en) 1978-11-28 1978-11-28 Pattern check system

Publications (1)

Publication Number Publication Date
JPS5572804A true JPS5572804A (en) 1980-06-02

Family

ID=15417510

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14687478A Pending JPS5572804A (en) 1978-11-28 1978-11-28 Pattern check system

Country Status (1)

Country Link
JP (1) JPS5572804A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5852510A (en) * 1981-09-24 1983-03-28 Toshiba Corp Pattern defect inspecting device
JPS5968205U (en) * 1982-10-30 1984-05-09 住友金属鉱山株式会社 Automatic dimension measuring device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5852510A (en) * 1981-09-24 1983-03-28 Toshiba Corp Pattern defect inspecting device
JPS5968205U (en) * 1982-10-30 1984-05-09 住友金属鉱山株式会社 Automatic dimension measuring device

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