JPS5572813A - Indication system for mask pattern correction point - Google Patents

Indication system for mask pattern correction point

Info

Publication number
JPS5572813A
JPS5572813A JP14687378A JP14687378A JPS5572813A JP S5572813 A JPS5572813 A JP S5572813A JP 14687378 A JP14687378 A JP 14687378A JP 14687378 A JP14687378 A JP 14687378A JP S5572813 A JPS5572813 A JP S5572813A
Authority
JP
Japan
Prior art keywords
pattern
defective
point
correction point
mask pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14687378A
Other languages
Japanese (ja)
Inventor
Taku Yoshida
Masayuki Oyama
Kikuo Mita
Masahito Nakajima
Katsumi Fujiwara
Tadao Nakakuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP14687378A priority Critical patent/JPS5572813A/en
Publication of JPS5572813A publication Critical patent/JPS5572813A/en
Pending legal-status Critical Current

Links

Landscapes

  • Image Analysis (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Length Measuring Devices With Unspecified Measuring Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Image Processing (AREA)

Abstract

PURPOSE: To indicate accurately a pattern correction point by forming a film sheet with a marked pattern defective position by controlling a position plotter by storing the pattern defective position in a memory unit.
CONSTITUTION: Inspected material pattern 1 is chcked pattern check unit 2 through scanning beam light and data indicating a defective point is stored in defective- point data memory unit 3. On the basis of the memory contents, position plotter 4 is controlled to give a mark to transparent film 5 in the same shape as pattern 1 according to the defective position. Then, pattern 1 and film 5, superposed mutually, are irradiated with light from light source 6 to indicate the defective position with accuracy, so that corrections will be made easily and definitely.
COPYRIGHT: (C)1980,JPO&Japio
JP14687378A 1978-11-28 1978-11-28 Indication system for mask pattern correction point Pending JPS5572813A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14687378A JPS5572813A (en) 1978-11-28 1978-11-28 Indication system for mask pattern correction point

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14687378A JPS5572813A (en) 1978-11-28 1978-11-28 Indication system for mask pattern correction point

Publications (1)

Publication Number Publication Date
JPS5572813A true JPS5572813A (en) 1980-06-02

Family

ID=15417488

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14687378A Pending JPS5572813A (en) 1978-11-28 1978-11-28 Indication system for mask pattern correction point

Country Status (1)

Country Link
JP (1) JPS5572813A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4478749A (en) * 1981-03-30 1984-10-23 E. R. Squibb & Sons, Inc. 2-Oxo-1-(substituted phosphorous)azetidines
JPS6123951A (en) * 1984-07-11 1986-02-01 Ibiden Co Ltd Detecting method of automatic inspection of outward shape of circuit
JPS6148304U (en) * 1984-09-05 1986-04-01
JPH0247540A (en) * 1988-08-10 1990-02-16 Toshiba Mach Co Ltd Inspecting apparatus of mask

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4478749A (en) * 1981-03-30 1984-10-23 E. R. Squibb & Sons, Inc. 2-Oxo-1-(substituted phosphorous)azetidines
JPS6123951A (en) * 1984-07-11 1986-02-01 Ibiden Co Ltd Detecting method of automatic inspection of outward shape of circuit
JPS6148304U (en) * 1984-09-05 1986-04-01
JPH0247540A (en) * 1988-08-10 1990-02-16 Toshiba Mach Co Ltd Inspecting apparatus of mask

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