JPS5572813A - Indication system for mask pattern correction point - Google Patents
Indication system for mask pattern correction pointInfo
- Publication number
- JPS5572813A JPS5572813A JP14687378A JP14687378A JPS5572813A JP S5572813 A JPS5572813 A JP S5572813A JP 14687378 A JP14687378 A JP 14687378A JP 14687378 A JP14687378 A JP 14687378A JP S5572813 A JPS5572813 A JP S5572813A
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- defective
- point
- correction point
- mask pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Image Analysis (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Length Measuring Devices With Unspecified Measuring Means (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Image Processing (AREA)
Abstract
PURPOSE: To indicate accurately a pattern correction point by forming a film sheet with a marked pattern defective position by controlling a position plotter by storing the pattern defective position in a memory unit.
CONSTITUTION: Inspected material pattern 1 is chcked pattern check unit 2 through scanning beam light and data indicating a defective point is stored in defective- point data memory unit 3. On the basis of the memory contents, position plotter 4 is controlled to give a mark to transparent film 5 in the same shape as pattern 1 according to the defective position. Then, pattern 1 and film 5, superposed mutually, are irradiated with light from light source 6 to indicate the defective position with accuracy, so that corrections will be made easily and definitely.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14687378A JPS5572813A (en) | 1978-11-28 | 1978-11-28 | Indication system for mask pattern correction point |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14687378A JPS5572813A (en) | 1978-11-28 | 1978-11-28 | Indication system for mask pattern correction point |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5572813A true JPS5572813A (en) | 1980-06-02 |
Family
ID=15417488
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14687378A Pending JPS5572813A (en) | 1978-11-28 | 1978-11-28 | Indication system for mask pattern correction point |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5572813A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4478749A (en) * | 1981-03-30 | 1984-10-23 | E. R. Squibb & Sons, Inc. | 2-Oxo-1-(substituted phosphorous)azetidines |
JPS6123951A (en) * | 1984-07-11 | 1986-02-01 | Ibiden Co Ltd | Detecting method of automatic inspection of outward shape of circuit |
JPS6148304U (en) * | 1984-09-05 | 1986-04-01 | ||
JPH0247540A (en) * | 1988-08-10 | 1990-02-16 | Toshiba Mach Co Ltd | Inspecting apparatus of mask |
-
1978
- 1978-11-28 JP JP14687378A patent/JPS5572813A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4478749A (en) * | 1981-03-30 | 1984-10-23 | E. R. Squibb & Sons, Inc. | 2-Oxo-1-(substituted phosphorous)azetidines |
JPS6123951A (en) * | 1984-07-11 | 1986-02-01 | Ibiden Co Ltd | Detecting method of automatic inspection of outward shape of circuit |
JPS6148304U (en) * | 1984-09-05 | 1986-04-01 | ||
JPH0247540A (en) * | 1988-08-10 | 1990-02-16 | Toshiba Mach Co Ltd | Inspecting apparatus of mask |
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