JPS5730837A - Manufacture of photomask for printing plate - Google Patents

Manufacture of photomask for printing plate

Info

Publication number
JPS5730837A
JPS5730837A JP10589380A JP10589380A JPS5730837A JP S5730837 A JPS5730837 A JP S5730837A JP 10589380 A JP10589380 A JP 10589380A JP 10589380 A JP10589380 A JP 10589380A JP S5730837 A JPS5730837 A JP S5730837A
Authority
JP
Japan
Prior art keywords
mark
film
mask pattern
standard hole
microscope
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10589380A
Other languages
Japanese (ja)
Inventor
Hideaki Obara
Masato Takigawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP10589380A priority Critical patent/JPS5730837A/en
Publication of JPS5730837A publication Critical patent/JPS5730837A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To provide a photomask manufacture method high in redundancy, by forming a mark for indicating a standard hole position with a drawing machine at the same time as a mask pattern. CONSTITUTION:A mask pattern is formed on a transparent film with a drawing machine. Mark information for indicating a standard hole boring position is read out at the same time as pattern information is read out from a memory in drawing a mask pattern to write this mark on a given region, resulting in keeping both the coordinate positions of the mark and the mask pattern on the transparent film perfectly in a prescribed relationship. The mask film 6 thus obtaned is set to the standard hole boring apparatus which is provided with a light source 1, a hollow punch 2, a die 4 fixed to a support frame 3, a finely adjustable 2-dimensional position controlling table 5, a through hole 7, a reflective mirror 8 located on the optical axis of a light source 1, and a microscope 9. A microfilm 6 is bored with the punch 2 to form a standard hole through the film 6 by observing the film 6 with the microscope 9 and aligning the optical axis with the mark position.
JP10589380A 1980-07-31 1980-07-31 Manufacture of photomask for printing plate Pending JPS5730837A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10589380A JPS5730837A (en) 1980-07-31 1980-07-31 Manufacture of photomask for printing plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10589380A JPS5730837A (en) 1980-07-31 1980-07-31 Manufacture of photomask for printing plate

Publications (1)

Publication Number Publication Date
JPS5730837A true JPS5730837A (en) 1982-02-19

Family

ID=14419579

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10589380A Pending JPS5730837A (en) 1980-07-31 1980-07-31 Manufacture of photomask for printing plate

Country Status (1)

Country Link
JP (1) JPS5730837A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0745267A1 (en) * 1994-12-20 1996-12-04 Baxter International Inc. System detecting holes in polarized containers to indicate processing
EP0745024A1 (en) * 1994-12-20 1996-12-04 Baxter International Inc. System to identify bags that have undergone a process

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0745267A1 (en) * 1994-12-20 1996-12-04 Baxter International Inc. System detecting holes in polarized containers to indicate processing
EP0745024A1 (en) * 1994-12-20 1996-12-04 Baxter International Inc. System to identify bags that have undergone a process
EP0745267A4 (en) * 1994-12-20 1999-04-07 Baxter Int System detecting holes in polarized containers to indicate processing
EP0745024A4 (en) * 1994-12-20 1999-07-21 Baxter Int System to identify bags that have undergone a process
US6158319A (en) * 1994-12-20 2000-12-12 Baxter International Inc. System to identify the status of bags that have been subjected to viral inactivation

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