JPS5691426A - Electron beam exposure device - Google Patents

Electron beam exposure device

Info

Publication number
JPS5691426A
JPS5691426A JP16906679A JP16906679A JPS5691426A JP S5691426 A JPS5691426 A JP S5691426A JP 16906679 A JP16906679 A JP 16906679A JP 16906679 A JP16906679 A JP 16906679A JP S5691426 A JPS5691426 A JP S5691426A
Authority
JP
Japan
Prior art keywords
electron beam
exposure device
beam exposure
stage
current density
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16906679A
Other languages
Japanese (ja)
Inventor
Hiroshi Yasuda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP16906679A priority Critical patent/JPS5691426A/en
Publication of JPS5691426A publication Critical patent/JPS5691426A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3007—Electron or ion-optical systems

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To obtain the performances of high resolution, high current density, large deflection, etc., by positioning a stage in the projection lens of an electron beam exposure device and providing pole pieces both above and under the specimen mounting surface of the stage. CONSTITUTION:The specimen mounting stage 14 of an electron beam exposure device consisting of a slit 28, a deflector 30, an iris 32, electron lenses 36, 38, 40, etc., is positioned in a projection lens 42, and pole pieces 42a and 42b are provided in the upper and lower parts. By so doing, a work distance L can be made small substantially, and a spherical aberration coefficient and a chromatic aberration coefficient can be made small, so that an electron beam exposure device of high resolution, high current density and large deflection can be obtained.
JP16906679A 1979-12-25 1979-12-25 Electron beam exposure device Pending JPS5691426A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16906679A JPS5691426A (en) 1979-12-25 1979-12-25 Electron beam exposure device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16906679A JPS5691426A (en) 1979-12-25 1979-12-25 Electron beam exposure device

Publications (1)

Publication Number Publication Date
JPS5691426A true JPS5691426A (en) 1981-07-24

Family

ID=15879695

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16906679A Pending JPS5691426A (en) 1979-12-25 1979-12-25 Electron beam exposure device

Country Status (1)

Country Link
JP (1) JPS5691426A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0129681A2 (en) * 1983-06-28 1985-01-02 International Business Machines Corporation Variable axis immerson lens electron beam projection system

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4984359A (en) * 1972-12-18 1974-08-13

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4984359A (en) * 1972-12-18 1974-08-13

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0129681A2 (en) * 1983-06-28 1985-01-02 International Business Machines Corporation Variable axis immerson lens electron beam projection system
US4544846A (en) * 1983-06-28 1985-10-01 International Business Machines Corporation Variable axis immersion lens electron beam projection system

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