JPS5691229A - Pattern forming method - Google Patents

Pattern forming method

Info

Publication number
JPS5691229A
JPS5691229A JP16812379A JP16812379A JPS5691229A JP S5691229 A JPS5691229 A JP S5691229A JP 16812379 A JP16812379 A JP 16812379A JP 16812379 A JP16812379 A JP 16812379A JP S5691229 A JPS5691229 A JP S5691229A
Authority
JP
Japan
Prior art keywords
photosensitive
ultraviolet rays
far ultraviolet
polymer
methylcellosolve
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16812379A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6131858B2 (enrdf_load_stackoverflow
Inventor
Kazuo Toda
Hiroshi Tokunaga
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP16812379A priority Critical patent/JPS5691229A/ja
Publication of JPS5691229A publication Critical patent/JPS5691229A/ja
Publication of JPS6131858B2 publication Critical patent/JPS6131858B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Polymerisation Methods In General (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP16812379A 1979-12-26 1979-12-26 Pattern forming method Granted JPS5691229A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16812379A JPS5691229A (en) 1979-12-26 1979-12-26 Pattern forming method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16812379A JPS5691229A (en) 1979-12-26 1979-12-26 Pattern forming method

Publications (2)

Publication Number Publication Date
JPS5691229A true JPS5691229A (en) 1981-07-24
JPS6131858B2 JPS6131858B2 (enrdf_load_stackoverflow) 1986-07-23

Family

ID=15862269

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16812379A Granted JPS5691229A (en) 1979-12-26 1979-12-26 Pattern forming method

Country Status (1)

Country Link
JP (1) JPS5691229A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5716446A (en) * 1980-07-04 1982-01-27 Fujitsu Ltd Formation of micropattern and photoresist used in said formation
JPS58203438A (ja) * 1982-05-24 1983-11-26 Hitachi Ltd 微細パタ−ン形成方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5716446A (en) * 1980-07-04 1982-01-27 Fujitsu Ltd Formation of micropattern and photoresist used in said formation
JPS58203438A (ja) * 1982-05-24 1983-11-26 Hitachi Ltd 微細パタ−ン形成方法

Also Published As

Publication number Publication date
JPS6131858B2 (enrdf_load_stackoverflow) 1986-07-23

Similar Documents

Publication Publication Date Title
JPS52134692A (en) Photopolymerizable composition
JPS56162744A (en) Formation of fine pattern
JPS5355362A (en) Organopolysiloxane composition
JPS5228875A (en) Mask
JPS5225651A (en) Process for fabricating an optical curved surface using a photopolymer izable adhesive
JPS5691229A (en) Pattern forming method
JPS5211774A (en) Method of detecting relative position of patterns
JPS5226171A (en) Mask creation method
JPS5339075A (en) Step and repeat exposure method of masks
JPS5230170A (en) Method of photoetching
JPS5339060A (en) Lot number marking method to wafers
JPS5230428A (en) Photoresist exposure method
JPS5389673A (en) Fine pattern forming method of semiconductor device
JPS5580323A (en) Pattern forming method for photoresist-film
JPS5211868A (en) Photoresist coating method
JPS535283A (en) Resin coated sheet
JPS5760327A (en) Image forming material
JPS57102926A (en) Light- or radiation-sensitive polymer composition
JPS5269270A (en) Coating method of photoresist
JPS5724538A (en) Preparation of semiconductor device
JPS55128832A (en) Method of making minute pattern
JPS533821A (en) Exposure method
JPS5399772A (en) Optical mask
JPS5629232A (en) Pattern forming material
JPS558013A (en) Semiconductor device manufacturing method