JPS568825A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JPS568825A
JPS568825A JP8437779A JP8437779A JPS568825A JP S568825 A JPS568825 A JP S568825A JP 8437779 A JP8437779 A JP 8437779A JP 8437779 A JP8437779 A JP 8437779A JP S568825 A JPS568825 A JP S568825A
Authority
JP
Japan
Prior art keywords
coated
layer
circuit element
semiconductor device
opening
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8437779A
Other languages
English (en)
Inventor
Minoru Nakajima
Shiro Takeda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP8437779A priority Critical patent/JPS568825A/ja
Publication of JPS568825A publication Critical patent/JPS568825A/ja
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02107Forming insulating materials on a substrate
    • H01L21/02109Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
    • H01L21/02112Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
    • H01L21/02118Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer carbon based polymeric organic or inorganic material, e.g. polyimides, poly cyclobutene or PVC
JP8437779A 1979-07-05 1979-07-05 Semiconductor device Pending JPS568825A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8437779A JPS568825A (en) 1979-07-05 1979-07-05 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8437779A JPS568825A (en) 1979-07-05 1979-07-05 Semiconductor device

Publications (1)

Publication Number Publication Date
JPS568825A true JPS568825A (en) 1981-01-29

Family

ID=13828841

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8437779A Pending JPS568825A (en) 1979-07-05 1979-07-05 Semiconductor device

Country Status (1)

Country Link
JP (1) JPS568825A (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0164750A2 (en) * 1984-06-12 1985-12-18 Olin Hunt Specialty Products Inc. Antireflective coatings for use in the manufacture of semiconductor devices, methods and solutions for making such coatings, and the method for using such coatings to absorb light in ultraviolet photolithography processes
JPS6436031A (en) * 1987-07-31 1989-02-07 Toshiba Corp Semiconductor device and manufacture thereof

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4617252A (en) * 1983-07-01 1986-10-14 Philip A. Hunt Chemical Corporation Antireflective coatings for use in the manufacture of semi-conductor devices, methods and solutions for making such coatings, and the method for using such coatings to absorb light in ultraviolet photolithography processes
EP0164750A2 (en) * 1984-06-12 1985-12-18 Olin Hunt Specialty Products Inc. Antireflective coatings for use in the manufacture of semiconductor devices, methods and solutions for making such coatings, and the method for using such coatings to absorb light in ultraviolet photolithography processes
JPS6436031A (en) * 1987-07-31 1989-02-07 Toshiba Corp Semiconductor device and manufacture thereof

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