JPS568817A - Manufacture of semiconductor device - Google Patents

Manufacture of semiconductor device

Info

Publication number
JPS568817A
JPS568817A JP8515379A JP8515379A JPS568817A JP S568817 A JPS568817 A JP S568817A JP 8515379 A JP8515379 A JP 8515379A JP 8515379 A JP8515379 A JP 8515379A JP S568817 A JPS568817 A JP S568817A
Authority
JP
Japan
Prior art keywords
pattern
buried layer
layer
aligning
semiconductor device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8515379A
Other languages
Japanese (ja)
Inventor
Toru Suganuma
Isamu Takashima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP8515379A priority Critical patent/JPS568817A/en
Publication of JPS568817A publication Critical patent/JPS568817A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To accurately align a main pattern with a main buried layer in a semiconductor device by displacing only an auxiliary aligning pattern beforehand for an auxiliary buried layer at predetermined distance in the same direction with respect to the other element pattern. CONSTITUTION:When pattern 7, 7' for a buried layer are aligned in the next step through an epitaxial layer, a pattern which is displaced by a distance DELTAx=kXtepi in the same direction as the direction of b of an aligning pattern 7' shown beforehand for a buried layer 1' with respect to the other element pattern is employed, where tepi represents the thickness of an epitaxial layer, and k represents approx. 0.5-1.0. When the buried layer pattern 2' on the surface of the epitaxial layer is merely accurately aligned in this manner with the aligning pattern 7', the buried layer 1 can be accurately aligned with the other pattern 7.
JP8515379A 1979-07-04 1979-07-04 Manufacture of semiconductor device Pending JPS568817A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8515379A JPS568817A (en) 1979-07-04 1979-07-04 Manufacture of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8515379A JPS568817A (en) 1979-07-04 1979-07-04 Manufacture of semiconductor device

Publications (1)

Publication Number Publication Date
JPS568817A true JPS568817A (en) 1981-01-29

Family

ID=13850713

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8515379A Pending JPS568817A (en) 1979-07-04 1979-07-04 Manufacture of semiconductor device

Country Status (1)

Country Link
JP (1) JPS568817A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59110118A (en) * 1982-12-15 1984-06-26 Matsushita Electronics Corp Manufacture of semiconductor device
US4629031A (en) * 1984-08-24 1986-12-16 Honda Giken Kogyo Kabushiki Kaisha Soundproof engine-operated machine
US7461617B2 (en) 2005-01-20 2008-12-09 Honda Motor Co., Ltd. Engine-driven work machine

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5434770A (en) * 1977-08-24 1979-03-14 Nec Corp Semiconductor substrate and manufacture of semiconductor using it
JPS5539685A (en) * 1978-09-14 1980-03-19 Nec Corp Semiconductor device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5434770A (en) * 1977-08-24 1979-03-14 Nec Corp Semiconductor substrate and manufacture of semiconductor using it
JPS5539685A (en) * 1978-09-14 1980-03-19 Nec Corp Semiconductor device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59110118A (en) * 1982-12-15 1984-06-26 Matsushita Electronics Corp Manufacture of semiconductor device
US4629031A (en) * 1984-08-24 1986-12-16 Honda Giken Kogyo Kabushiki Kaisha Soundproof engine-operated machine
US7461617B2 (en) 2005-01-20 2008-12-09 Honda Motor Co., Ltd. Engine-driven work machine

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