JPS5687665A - Ion etching method - Google Patents

Ion etching method

Info

Publication number
JPS5687665A
JPS5687665A JP16472879A JP16472879A JPS5687665A JP S5687665 A JPS5687665 A JP S5687665A JP 16472879 A JP16472879 A JP 16472879A JP 16472879 A JP16472879 A JP 16472879A JP S5687665 A JPS5687665 A JP S5687665A
Authority
JP
Japan
Prior art keywords
etched
ion beams
substance
holder
angle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16472879A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6312143B2 (enExample
Inventor
Haruo Okano
Yasuhiro Horiike
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP16472879A priority Critical patent/JPS5687665A/ja
Publication of JPS5687665A publication Critical patent/JPS5687665A/ja
Publication of JPS6312143B2 publication Critical patent/JPS6312143B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
  • ing And Chemical Polishing (AREA)
JP16472879A 1979-12-20 1979-12-20 Ion etching method Granted JPS5687665A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16472879A JPS5687665A (en) 1979-12-20 1979-12-20 Ion etching method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16472879A JPS5687665A (en) 1979-12-20 1979-12-20 Ion etching method

Publications (2)

Publication Number Publication Date
JPS5687665A true JPS5687665A (en) 1981-07-16
JPS6312143B2 JPS6312143B2 (enExample) 1988-03-17

Family

ID=15798764

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16472879A Granted JPS5687665A (en) 1979-12-20 1979-12-20 Ion etching method

Country Status (1)

Country Link
JP (1) JPS5687665A (enExample)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5221232A (en) * 1975-08-13 1977-02-17 Nichiden Varian Kk Ionnetching method
JPS5328530A (en) * 1976-08-30 1978-03-16 Hitachi Ltd Method of etching surfaces of solids

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5221232A (en) * 1975-08-13 1977-02-17 Nichiden Varian Kk Ionnetching method
JPS5328530A (en) * 1976-08-30 1978-03-16 Hitachi Ltd Method of etching surfaces of solids

Also Published As

Publication number Publication date
JPS6312143B2 (enExample) 1988-03-17

Similar Documents

Publication Publication Date Title
EP0217361B1 (en) Ion source
US4259145A (en) Ion source for reactive ion etching
JPS55134175A (en) Microwave plasma etching unit
JPS57201527A (en) Ion implantation method
JPS56105483A (en) Dry etching device
US4496449A (en) Electron beam etching of integrated circuit structures
JPS5687665A (en) Ion etching method
JPS57174466A (en) Dry etching method
JPS5460236A (en) Etching method
JPS5254897A (en) Plasma ion source for solid materials
JPS54102872A (en) Ion etching method
JPS5747800A (en) Etching method for crystal substrate
JPS55154581A (en) Ion etching method
JPS57131373A (en) Plasma etching device
JPS59225525A (ja) 反応性イオンビ−ムエツチング装置
JPS5675573A (en) Ion etching method
JPS6453422A (en) Dry etching device
JPS55104484A (en) Ion etching method
JPS57171660A (en) Method and device for vacuum deposition
JPS57154833A (en) Etching method by reactive ion
JPS563680A (en) Etching method
JPS5575220A (en) Ion-etching apparatus
JPS55104483A (en) Ion etching method
JPS56137636A (en) Ion etching method
JPS6487790A (en) Dry etching method