JPS5685878A - Manufacture of photoelectric conversion element - Google Patents

Manufacture of photoelectric conversion element

Info

Publication number
JPS5685878A
JPS5685878A JP16372379A JP16372379A JPS5685878A JP S5685878 A JPS5685878 A JP S5685878A JP 16372379 A JP16372379 A JP 16372379A JP 16372379 A JP16372379 A JP 16372379A JP S5685878 A JPS5685878 A JP S5685878A
Authority
JP
Japan
Prior art keywords
layer
vacuum
amorphous
torr
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16372379A
Other languages
English (en)
Japanese (ja)
Other versions
JPS634356B2 (enrdf_load_stackoverflow
Inventor
Takashi Murayama
Kazuhiro Kawajiri
Yuzo Mizobuchi
Yasusuke Nakajima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP16372379A priority Critical patent/JPS5685878A/ja
Publication of JPS5685878A publication Critical patent/JPS5685878A/ja
Publication of JPS634356B2 publication Critical patent/JPS634356B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F30/00Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors
    • H10F30/20Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors
    • H10F30/21Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation
    • H10F30/22Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation the devices having only one potential barrier, e.g. photodiodes
    • H10F30/222Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation the devices having only one potential barrier, e.g. photodiodes the potential barrier being a PN heterojunction

Landscapes

  • Photovoltaic Devices (AREA)
JP16372379A 1979-12-17 1979-12-17 Manufacture of photoelectric conversion element Granted JPS5685878A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16372379A JPS5685878A (en) 1979-12-17 1979-12-17 Manufacture of photoelectric conversion element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16372379A JPS5685878A (en) 1979-12-17 1979-12-17 Manufacture of photoelectric conversion element

Publications (2)

Publication Number Publication Date
JPS5685878A true JPS5685878A (en) 1981-07-13
JPS634356B2 JPS634356B2 (enrdf_load_stackoverflow) 1988-01-28

Family

ID=15779431

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16372379A Granted JPS5685878A (en) 1979-12-17 1979-12-17 Manufacture of photoelectric conversion element

Country Status (1)

Country Link
JP (1) JPS5685878A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59151476A (ja) * 1983-02-18 1984-08-29 Fuji Xerox Co Ltd 光電変換素子
JPS59229881A (ja) * 1983-06-08 1984-12-24 Fuji Xerox Co Ltd 光電変換素子の製造方法
CN100399584C (zh) * 2005-12-01 2008-07-02 上海交通大学 一种二氧化锡/硅异质结太阳电池

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59151476A (ja) * 1983-02-18 1984-08-29 Fuji Xerox Co Ltd 光電変換素子
JPS59229881A (ja) * 1983-06-08 1984-12-24 Fuji Xerox Co Ltd 光電変換素子の製造方法
CN100399584C (zh) * 2005-12-01 2008-07-02 上海交通大学 一种二氧化锡/硅异质结太阳电池

Also Published As

Publication number Publication date
JPS634356B2 (enrdf_load_stackoverflow) 1988-01-28

Similar Documents

Publication Publication Date Title
US4740829A (en) Semiconductor device having a thin layer comprising germanium atoms as a matrix with a restricted range of hydrogen atom concentration
US5248621A (en) Method for producing solar cell devices of crystalline material
US4814842A (en) Thin film transistor utilizing hydrogenated polycrystalline silicon
US4237151A (en) Thermal decomposition of silane to form hydrogenated amorphous Si film
US4905072A (en) Semiconductor element
JPS5562778A (en) Preparation of photoconductor film
JPH0449789B2 (enrdf_load_stackoverflow)
US4657775A (en) Method for production of silicon thin film piezoresistive devices
US5211761A (en) Photovoltaic device and manufacturing method thereof
JPS5685878A (en) Manufacture of photoelectric conversion element
JPS57197848A (en) Semiconductor device and manufacture thereof
JPS56142680A (en) Photoconductive semiconductor device
JPS6366415B2 (enrdf_load_stackoverflow)
JPS5614408A (en) Manufacture of solid electrolyte
JPS6361768B2 (enrdf_load_stackoverflow)
JPS60178618A (ja) 薄膜形成法
JPS6415969A (en) Solid-state image sensing device and manufacture thereof
JPS5614412A (en) Manufacture of amorphous silicon film
JPS645002A (en) Temperature detector
JPH0373149B2 (enrdf_load_stackoverflow)
JPH04299575A (ja) 多結晶半導体層の形成方法及びこれを用いた光起電力装置の製造方法
JPH025017B2 (enrdf_load_stackoverflow)
JPS6481276A (en) Semiconductor radiation detector
JPS6461959A (en) Manufacture of transparent conductive film for amorphous silicon solar cell
JPS6450574A (en) Manufacture of hetero-junction element