JPS5681844A - Production of photomask for ic with airflow passage - Google Patents

Production of photomask for ic with airflow passage

Info

Publication number
JPS5681844A
JPS5681844A JP15886479A JP15886479A JPS5681844A JP S5681844 A JPS5681844 A JP S5681844A JP 15886479 A JP15886479 A JP 15886479A JP 15886479 A JP15886479 A JP 15886479A JP S5681844 A JPS5681844 A JP S5681844A
Authority
JP
Japan
Prior art keywords
photoresist layer
silicone film
photomask
vapor deposition
metal vapor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15886479A
Other languages
Japanese (ja)
Other versions
JPS629894B2 (en
Inventor
Hiroshi Asada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Citizen Watch Co Ltd
Original Assignee
Citizen Watch Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Citizen Watch Co Ltd filed Critical Citizen Watch Co Ltd
Priority to JP15886479A priority Critical patent/JPS5681844A/en
Publication of JPS5681844A publication Critical patent/JPS5681844A/en
Publication of JPS629894B2 publication Critical patent/JPS629894B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof

Abstract

PURPOSE:To obtain a photomask which permits expulsion of air in a short time at contacting by forming a silicone film having a certain fixed height on the top surface of the figure surface of printing patterns, and forming a flow passage for air by this film part. CONSTITUTION:A silicone film 4 of about 5,000-7,000Angstrom in thicknesses is formed over the entire surface of a transparent plate 1 formed with metal vapor deposition patterns 2 on one side and further a photoresist layer 5 is formed thereon. Thence, ultraviolet rays are irradiated over the entire surface from the back surface 6 side of the transparent plate 1 to expose the photoresist layer 5. After the exposure, the photoresist layer is developed, whereby the photoresist layer 5' is remained only on the top surface of the metal vapor deposition patterns 2. Further, the silicone film layer 4 is dissolved and etched off except the parts 4' corresponding to the unexposed parts, thence the photoresist layer 5' is peeled and only the top surfaces of the metal vapor deposition patterns 2 are coated with the silicone film 4', whereby airflow passages 7 are formed in the clearances between the respective silicone film thicknesses and the titled photomask is thereby obtained.
JP15886479A 1979-12-07 1979-12-07 Production of photomask for ic with airflow passage Granted JPS5681844A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15886479A JPS5681844A (en) 1979-12-07 1979-12-07 Production of photomask for ic with airflow passage

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15886479A JPS5681844A (en) 1979-12-07 1979-12-07 Production of photomask for ic with airflow passage

Publications (2)

Publication Number Publication Date
JPS5681844A true JPS5681844A (en) 1981-07-04
JPS629894B2 JPS629894B2 (en) 1987-03-03

Family

ID=15681059

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15886479A Granted JPS5681844A (en) 1979-12-07 1979-12-07 Production of photomask for ic with airflow passage

Country Status (1)

Country Link
JP (1) JPS5681844A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6300042B1 (en) 1998-11-24 2001-10-09 Motorola, Inc. Lithographic printing method using a low surface energy layer

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6300042B1 (en) 1998-11-24 2001-10-09 Motorola, Inc. Lithographic printing method using a low surface energy layer
US6562553B2 (en) 1998-11-24 2003-05-13 Motorola, Inc. Lithographic printing method using a low surface energy layer

Also Published As

Publication number Publication date
JPS629894B2 (en) 1987-03-03

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