JPS57101837A - Photomask - Google Patents

Photomask

Info

Publication number
JPS57101837A
JPS57101837A JP17710380A JP17710380A JPS57101837A JP S57101837 A JPS57101837 A JP S57101837A JP 17710380 A JP17710380 A JP 17710380A JP 17710380 A JP17710380 A JP 17710380A JP S57101837 A JPS57101837 A JP S57101837A
Authority
JP
Japan
Prior art keywords
film
transparent
substrate
high precision
heat conductivity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17710380A
Other languages
Japanese (ja)
Inventor
Noriaki Nakayama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP17710380A priority Critical patent/JPS57101837A/en
Publication of JPS57101837A publication Critical patent/JPS57101837A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Surface Treatment Of Glass (AREA)

Abstract

PURPOSE:To prevent a resist from changing due to overheat during patternwise exposure, and to obtain a photomask of high precision, by providing a transparent film higher than a transparent substrate in heat conductivity between the substrate and a metallic film for a mask, and forming a resist film the metallic film. CONSTITUTION:A transparent thin film 5 made of TiO2, BeO, or Al2O3 higher than a transparent glass substrate 1 in heat conductivity is formed between the substrate 1 and a thin opaque metallic chromium film 2. A resist film 3 is provided on the film 2 to depict a pattern with electron beams 4. High heat conductivity of the thin film 5 allows heat 6 produced by the beams 4 to be absorbed by the firlm 5 and released by heat conduction 7, reduces thermal change of the layer 3, and forms a high precision pattern, thus permitting a photomask for fabrication of semiconductor elements, etc. to be obtained with high precision.
JP17710380A 1980-12-17 1980-12-17 Photomask Pending JPS57101837A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17710380A JPS57101837A (en) 1980-12-17 1980-12-17 Photomask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17710380A JPS57101837A (en) 1980-12-17 1980-12-17 Photomask

Publications (1)

Publication Number Publication Date
JPS57101837A true JPS57101837A (en) 1982-06-24

Family

ID=16025193

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17710380A Pending JPS57101837A (en) 1980-12-17 1980-12-17 Photomask

Country Status (1)

Country Link
JP (1) JPS57101837A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60107033A (en) * 1983-11-14 1985-06-12 Fujitsu Ltd Substrate for pattern formation with charged electron beam
CN102444225A (en) * 2011-09-13 2012-05-09 苏州市伦琴工业设计有限公司 Explosion-proof glass

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60107033A (en) * 1983-11-14 1985-06-12 Fujitsu Ltd Substrate for pattern formation with charged electron beam
CN102444225A (en) * 2011-09-13 2012-05-09 苏州市伦琴工业设计有限公司 Explosion-proof glass

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