JPS5678156A - Charge pump semiconductor memory - Google Patents
Charge pump semiconductor memoryInfo
- Publication number
- JPS5678156A JPS5678156A JP15533679A JP15533679A JPS5678156A JP S5678156 A JPS5678156 A JP S5678156A JP 15533679 A JP15533679 A JP 15533679A JP 15533679 A JP15533679 A JP 15533679A JP S5678156 A JPS5678156 A JP S5678156A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- type
- region
- electrode
- insulating substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
Landscapes
- Static Random-Access Memory (AREA)
- Semiconductor Memories (AREA)
- Non-Volatile Memory (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15533679A JPS5678156A (en) | 1979-11-30 | 1979-11-30 | Charge pump semiconductor memory |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15533679A JPS5678156A (en) | 1979-11-30 | 1979-11-30 | Charge pump semiconductor memory |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5678156A true JPS5678156A (en) | 1981-06-26 |
JPS6143859B2 JPS6143859B2 (enrdf_load_stackoverflow) | 1986-09-30 |
Family
ID=15603657
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15533679A Granted JPS5678156A (en) | 1979-11-30 | 1979-11-30 | Charge pump semiconductor memory |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5678156A (enrdf_load_stackoverflow) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS627150A (ja) * | 1985-07-03 | 1987-01-14 | Agency Of Ind Science & Technol | 半導体装置における書込み、読出し方法 |
EP0902482A1 (en) * | 1997-09-05 | 1999-03-17 | Sharp Kabushiki Kaisha | SOI-MOSFET and fabrication process thereof |
EP1180799A3 (en) * | 2000-08-17 | 2005-09-28 | Kabushiki Kaisha Toshiba | Semiconductor memory device and method of manufacturing the same |
-
1979
- 1979-11-30 JP JP15533679A patent/JPS5678156A/ja active Granted
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS627150A (ja) * | 1985-07-03 | 1987-01-14 | Agency Of Ind Science & Technol | 半導体装置における書込み、読出し方法 |
EP0902482A1 (en) * | 1997-09-05 | 1999-03-17 | Sharp Kabushiki Kaisha | SOI-MOSFET and fabrication process thereof |
US6288425B1 (en) | 1997-09-05 | 2001-09-11 | Sharp Kabushiki Kaisha | SOI-MOSFET device |
EP1180799A3 (en) * | 2000-08-17 | 2005-09-28 | Kabushiki Kaisha Toshiba | Semiconductor memory device and method of manufacturing the same |
US7242608B2 (en) | 2000-08-17 | 2007-07-10 | Kabushiki Kaisha Toshiba | Semiconductor memory device having a floating storage bulk region capable of holding/emitting excessive majority carriers |
US7257015B2 (en) | 2000-08-17 | 2007-08-14 | Kabushiki Kaisha Toshiba | Semiconductor memory device having a floating storage bulk region |
US7710785B2 (en) | 2000-08-17 | 2010-05-04 | Kabushiki Kaisha Toshiba | Semiconductor memory device having a floating storage bulk region capable of holding/emitting excessive majority carriers |
US7855920B2 (en) | 2000-08-17 | 2010-12-21 | Kabushiki Kaisha Toshiba | Semiconductor memory device having a floating storage bulk region capable of holding/emitting excessive majority carriers |
Also Published As
Publication number | Publication date |
---|---|
JPS6143859B2 (enrdf_load_stackoverflow) | 1986-09-30 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP2929291B2 (ja) | 絶縁ゲート電界効果トランジスタの製造方法 | |
EP0494628A2 (en) | Multigato SOI-type thin film transistor and manufacturing method therefor | |
JPS5457875A (en) | Semiconductor nonvolatile memory device | |
EP0487739A4 (en) | Method of manufacturing semiconductor device | |
JPS5696854A (en) | Semiconductor memory device | |
JP3057770B2 (ja) | 薄膜トランジスタの製造方法 | |
JPS5678156A (en) | Charge pump semiconductor memory | |
JPS5632764A (en) | Charge coupled device | |
JPS54156483A (en) | Non-volatile semiconductor memory device | |
JPS5670662A (en) | Insulated gate type field effect transistor | |
JPS57132365A (en) | Nonvolatile semiconductor memory storage | |
JPS54139488A (en) | Mos semiconductor element and its manufacture | |
JPS572579A (en) | Manufacture of junction type field effect transistor | |
JPS57121271A (en) | Field effect transistor | |
JPS5492180A (en) | Manufacture of semiconductor device | |
KR970003916B1 (ko) | 소오스 및 드레인 깊이 확장부를 가진 반도체장치 및 그 제조 방법 | |
JPS5721865A (en) | Manufacture of semiconductor device | |
JPS5499578A (en) | Field effect transistor | |
JPS5771170A (en) | Manufacture of complementary mos semiconductor device | |
JPS55113364A (en) | Semiconductor integrated circuit device | |
JPS55121681A (en) | Manufacture of semiconductor device | |
JPS5753958A (ja) | Handotaisochi | |
JPS5586146A (en) | Mos dynamic memory element | |
JPS55102274A (en) | Insulated gate field effect transistor | |
JPH0789572B2 (ja) | 半導体装置 |