JPS5670658A - Semiconductor capacitor - Google Patents
Semiconductor capacitorInfo
- Publication number
- JPS5670658A JPS5670658A JP14905179A JP14905179A JPS5670658A JP S5670658 A JPS5670658 A JP S5670658A JP 14905179 A JP14905179 A JP 14905179A JP 14905179 A JP14905179 A JP 14905179A JP S5670658 A JPS5670658 A JP S5670658A
- Authority
- JP
- Japan
- Prior art keywords
- oxide film
- film
- preventing
- dynamic memory
- alpha rays
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B12/00—Dynamic random access memory [DRAM] devices
- H10B12/30—DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells
Landscapes
- Semiconductor Memories (AREA)
- Semiconductor Integrated Circuits (AREA)
Abstract
PURPOSE:To obtain a dynamic memory preventing software error occurred due to alpha rays by using a polycrystalline semiconductor film formed through an insulating film on a semiconductor substrate as an electrode layer of an MOS capacitor. CONSTITUTION:An oxide film 8 is selectively formed on the surface of a p type substrate 6, is coated with a polycrystlline silicon film 7, and the film 7 is patterned. Then, it is oxidized with oxidation resistant mask, and an isolating silicon oxide film 9 is formed thereon. Thereafter, gate oxide film 1, polysilicon films 2, 3, gate oxide film 4 and n<+> type region 5 are formed by an ordinary dynamic memory forming process. Since the memory capacitor is thus surrounded by the oxide film if electron and hole pair are formed due to the irradiation of the alpha rays, it is not affected by the interruption of the oxide film, thereby preventing the occurrence of the software error.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14905179A JPS5670658A (en) | 1979-11-14 | 1979-11-14 | Semiconductor capacitor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14905179A JPS5670658A (en) | 1979-11-14 | 1979-11-14 | Semiconductor capacitor |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5670658A true JPS5670658A (en) | 1981-06-12 |
Family
ID=15466572
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14905179A Pending JPS5670658A (en) | 1979-11-14 | 1979-11-14 | Semiconductor capacitor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5670658A (en) |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5454587A (en) * | 1977-10-08 | 1979-04-28 | Cho Lsi Gijutsu Kenkyu Kumiai | Semiconductor |
JPS561559A (en) * | 1979-06-19 | 1981-01-09 | Fujitsu Ltd | One-transistor type dynamic memory cell |
-
1979
- 1979-11-14 JP JP14905179A patent/JPS5670658A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5454587A (en) * | 1977-10-08 | 1979-04-28 | Cho Lsi Gijutsu Kenkyu Kumiai | Semiconductor |
JPS561559A (en) * | 1979-06-19 | 1981-01-09 | Fujitsu Ltd | One-transistor type dynamic memory cell |
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