JPS5670646A - Manufacture of semiconductor device - Google Patents

Manufacture of semiconductor device

Info

Publication number
JPS5670646A
JPS5670646A JP14674079A JP14674079A JPS5670646A JP S5670646 A JPS5670646 A JP S5670646A JP 14674079 A JP14674079 A JP 14674079A JP 14674079 A JP14674079 A JP 14674079A JP S5670646 A JPS5670646 A JP S5670646A
Authority
JP
Japan
Prior art keywords
melting point
insulating film
high melting
point metal
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14674079A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6141130B2 (enrdf_load_stackoverflow
Inventor
Shinichi Inoue
Hiroshi Tokunaga
Nobuo Toyokura
Hajime Ishikawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP14674079A priority Critical patent/JPS5670646A/ja
Publication of JPS5670646A publication Critical patent/JPS5670646A/ja
Publication of JPS6141130B2 publication Critical patent/JPS6141130B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
JP14674079A 1979-11-13 1979-11-13 Manufacture of semiconductor device Granted JPS5670646A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14674079A JPS5670646A (en) 1979-11-13 1979-11-13 Manufacture of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14674079A JPS5670646A (en) 1979-11-13 1979-11-13 Manufacture of semiconductor device

Publications (2)

Publication Number Publication Date
JPS5670646A true JPS5670646A (en) 1981-06-12
JPS6141130B2 JPS6141130B2 (enrdf_load_stackoverflow) 1986-09-12

Family

ID=15414515

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14674079A Granted JPS5670646A (en) 1979-11-13 1979-11-13 Manufacture of semiconductor device

Country Status (1)

Country Link
JP (1) JPS5670646A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5931065A (ja) * 1982-08-16 1984-02-18 Nippon Telegr & Teleph Corp <Ntt> 半導体装置の製造方法
JPS6083373A (ja) * 1983-10-14 1985-05-11 Nec Corp 薄膜トランジスタアレイとその製造方法

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0272232U (enrdf_load_stackoverflow) * 1988-11-18 1990-06-01
JP7565885B2 (ja) 2021-07-27 2024-10-11 三菱電機株式会社 半導体装置の製造方法および半導体製造装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5931065A (ja) * 1982-08-16 1984-02-18 Nippon Telegr & Teleph Corp <Ntt> 半導体装置の製造方法
JPS6083373A (ja) * 1983-10-14 1985-05-11 Nec Corp 薄膜トランジスタアレイとその製造方法

Also Published As

Publication number Publication date
JPS6141130B2 (enrdf_load_stackoverflow) 1986-09-12

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