JPS5669815A - Manufacture of oxide magnetic thin film - Google Patents

Manufacture of oxide magnetic thin film

Info

Publication number
JPS5669815A
JPS5669815A JP14666279A JP14666279A JPS5669815A JP S5669815 A JPS5669815 A JP S5669815A JP 14666279 A JP14666279 A JP 14666279A JP 14666279 A JP14666279 A JP 14666279A JP S5669815 A JPS5669815 A JP S5669815A
Authority
JP
Japan
Prior art keywords
spattering
target
thin film
preliminary
fe3o4
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14666279A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6246970B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Inventor
Masamichi Tagami
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP14666279A priority Critical patent/JPS5669815A/ja
Publication of JPS5669815A publication Critical patent/JPS5669815A/ja
Publication of JPS6246970B2 publication Critical patent/JPS6246970B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/14Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
    • H01F41/18Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates by cathode sputtering

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Physical Vapour Deposition (AREA)
  • Thin Magnetic Films (AREA)
JP14666279A 1979-11-13 1979-11-13 Manufacture of oxide magnetic thin film Granted JPS5669815A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14666279A JPS5669815A (en) 1979-11-13 1979-11-13 Manufacture of oxide magnetic thin film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14666279A JPS5669815A (en) 1979-11-13 1979-11-13 Manufacture of oxide magnetic thin film

Publications (2)

Publication Number Publication Date
JPS5669815A true JPS5669815A (en) 1981-06-11
JPS6246970B2 JPS6246970B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1987-10-06

Family

ID=15412778

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14666279A Granted JPS5669815A (en) 1979-11-13 1979-11-13 Manufacture of oxide magnetic thin film

Country Status (1)

Country Link
JP (1) JPS5669815A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Also Published As

Publication number Publication date
JPS6246970B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1987-10-06

Similar Documents

Publication Publication Date Title
JPS5528530A (en) Optical information recording method
JPS5730341A (en) Substrate processing device
JPS5669815A (en) Manufacture of oxide magnetic thin film
JPS51133700A (en) Process for storing the radioactive rare gas
JPS51140870A (en) An exhaust gas treatment process
JPS5587435A (en) Method of producing semiconductor device
JPS5666038A (en) Formation of micro-pattern
JPS5754333A (ja) Handotaisochitosonoseizohoho
JPS6483655A (en) Sputtering film formation
JPS52139373A (en) Treating method for compound semiconductor
JPS5228274A (en) Containing method of wafer to magazine
JPS5779625A (en) Gettering of silicon wafer
JPS57109341A (en) Semiconductor integrated circuit and manufacture thereof
JPS5473575A (en) Etching method
JPS5587439A (en) Manufacture of semiconductor device
JPS55167139A (en) Manufacture of oxide magnetic thin film
JPS5626540A (en) Selective oxidation of silicon in oxygen plasma
JPS5421278A (en) Plasma etching method
JPS5633477A (en) Plasma etching method
JPS51133699A (en) Process for storing the radioactive rare gas
JPS55115350A (en) Manufacture of semiconductor device
JPS5247677A (en) Process for production of semiconductor device
JPS5376758A (en) Plasma etching method
JPS5278601A (en) Vacuum degassing of molten metal
JPS5569266A (en) Selective adhering method of metal