JPS5660441A - Photosensitive resin composition improved in water development property and manufacture of photosensitive resin plate using this composition - Google Patents
Photosensitive resin composition improved in water development property and manufacture of photosensitive resin plate using this compositionInfo
- Publication number
- JPS5660441A JPS5660441A JP13626179A JP13626179A JPS5660441A JP S5660441 A JPS5660441 A JP S5660441A JP 13626179 A JP13626179 A JP 13626179A JP 13626179 A JP13626179 A JP 13626179A JP S5660441 A JPS5660441 A JP S5660441A
- Authority
- JP
- Japan
- Prior art keywords
- composition
- photosensitive resin
- surfactants
- resin plate
- photosensitive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13626179A JPS5660441A (en) | 1979-10-22 | 1979-10-22 | Photosensitive resin composition improved in water development property and manufacture of photosensitive resin plate using this composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13626179A JPS5660441A (en) | 1979-10-22 | 1979-10-22 | Photosensitive resin composition improved in water development property and manufacture of photosensitive resin plate using this composition |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5660441A true JPS5660441A (en) | 1981-05-25 |
JPH0128365B2 JPH0128365B2 (ja) | 1989-06-02 |
Family
ID=15171042
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13626179A Granted JPS5660441A (en) | 1979-10-22 | 1979-10-22 | Photosensitive resin composition improved in water development property and manufacture of photosensitive resin plate using this composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5660441A (ja) |
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59137943A (ja) * | 1983-01-28 | 1984-08-08 | W R Gureesu:Kk | 感光性樹脂組成物 |
JPS59155836A (ja) * | 1983-02-24 | 1984-09-05 | Tokyo Ohka Kogyo Co Ltd | 感光性組成物 |
JPS59170835A (ja) * | 1983-03-17 | 1984-09-27 | Toray Ind Inc | 感光性樹脂組成物 |
JPS59195235A (ja) * | 1983-04-20 | 1984-11-06 | Toray Ind Inc | 感光性樹脂組成物 |
JPS6278549A (ja) * | 1985-07-18 | 1987-04-10 | マイクロシィ・インコーポレーテッド | 放射感受性フイルム用現像液およびこれを用いる現像法 |
JPS63218957A (ja) * | 1987-03-09 | 1988-09-12 | Nippon Kayaku Co Ltd | 可染性樹脂膜のパタ−ン形成法 |
WO1995030935A1 (fr) * | 1994-05-10 | 1995-11-16 | Asahi Kasei Kogyo Kabushiki Kaisha | Composition de resine liquide photosensible pour la flexographie |
WO1996002020A1 (fr) * | 1994-07-12 | 1996-01-25 | Asahi Kasei Kogyo Kabushiki Kaisha | Procede d'elimination de l'adhesivite de surface d'une plaque d'impression en relief en resine photosensible |
US9331338B2 (en) | 2012-11-14 | 2016-05-03 | Samsung Electronics Co., Ltd. | Polymer composition for lithium secondary battery, electrode for lithium secondary battery including the same, and lithium secondary battery including the electrode |
US9472806B2 (en) | 2013-09-17 | 2016-10-18 | Samsung Electronics Co., Ltd. | Polymer, electrode for lithium batteries including the polymer, and lithium battery including the electrode |
EP3184568A1 (en) | 2015-12-21 | 2017-06-28 | Evonik Degussa GmbH | Acrylate-terminated urethane polybutadienes from low-monomer 1:1 monoadductes from reactive olefinic compounds and diisocyanates and hydroxy-terminated polybutadienes for liquid optically clear adhesives (locas) |
EP3184567A1 (de) | 2015-12-21 | 2017-06-28 | Evonik Degussa GmbH | Acrylatterminierte urethanpolybutadiene aus monomerarmen 1:1 monoaddukten aus reaktiven olfinischen verbindungen und diisocyanaten und hydroxyterminierten polybutadienen |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4923844A (ja) * | 1972-06-28 | 1974-03-02 | ||
JPS503041A (ja) * | 1973-05-15 | 1975-01-13 | ||
JPS52144970A (en) * | 1976-05-28 | 1977-12-02 | Hitachi Ltd | Photo resist composition |
JPS54135004A (en) * | 1978-04-10 | 1979-10-19 | Fuji Photo Film Co Ltd | Photosensitive flat printing plate |
-
1979
- 1979-10-22 JP JP13626179A patent/JPS5660441A/ja active Granted
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4923844A (ja) * | 1972-06-28 | 1974-03-02 | ||
JPS503041A (ja) * | 1973-05-15 | 1975-01-13 | ||
JPS52144970A (en) * | 1976-05-28 | 1977-12-02 | Hitachi Ltd | Photo resist composition |
JPS54135004A (en) * | 1978-04-10 | 1979-10-19 | Fuji Photo Film Co Ltd | Photosensitive flat printing plate |
Cited By (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59137943A (ja) * | 1983-01-28 | 1984-08-08 | W R Gureesu:Kk | 感光性樹脂組成物 |
JPH0449703B2 (ja) * | 1983-02-24 | 1992-08-12 | Tokyo Ohka Kogyo Co Ltd | |
JPS59155836A (ja) * | 1983-02-24 | 1984-09-05 | Tokyo Ohka Kogyo Co Ltd | 感光性組成物 |
JPS59170835A (ja) * | 1983-03-17 | 1984-09-27 | Toray Ind Inc | 感光性樹脂組成物 |
JPS59195235A (ja) * | 1983-04-20 | 1984-11-06 | Toray Ind Inc | 感光性樹脂組成物 |
JPS6278549A (ja) * | 1985-07-18 | 1987-04-10 | マイクロシィ・インコーポレーテッド | 放射感受性フイルム用現像液およびこれを用いる現像法 |
JPS63218957A (ja) * | 1987-03-09 | 1988-09-12 | Nippon Kayaku Co Ltd | 可染性樹脂膜のパタ−ン形成法 |
WO1995030935A1 (fr) * | 1994-05-10 | 1995-11-16 | Asahi Kasei Kogyo Kabushiki Kaisha | Composition de resine liquide photosensible pour la flexographie |
GB2302545B (en) * | 1994-05-10 | 1998-07-08 | Asahi Chemical Ind | Liquid photosensitive resin composition for flexography |
WO1996002020A1 (fr) * | 1994-07-12 | 1996-01-25 | Asahi Kasei Kogyo Kabushiki Kaisha | Procede d'elimination de l'adhesivite de surface d'une plaque d'impression en relief en resine photosensible |
US9331338B2 (en) | 2012-11-14 | 2016-05-03 | Samsung Electronics Co., Ltd. | Polymer composition for lithium secondary battery, electrode for lithium secondary battery including the same, and lithium secondary battery including the electrode |
US9472806B2 (en) | 2013-09-17 | 2016-10-18 | Samsung Electronics Co., Ltd. | Polymer, electrode for lithium batteries including the polymer, and lithium battery including the electrode |
EP3184568A1 (en) | 2015-12-21 | 2017-06-28 | Evonik Degussa GmbH | Acrylate-terminated urethane polybutadienes from low-monomer 1:1 monoadductes from reactive olefinic compounds and diisocyanates and hydroxy-terminated polybutadienes for liquid optically clear adhesives (locas) |
EP3184567A1 (de) | 2015-12-21 | 2017-06-28 | Evonik Degussa GmbH | Acrylatterminierte urethanpolybutadiene aus monomerarmen 1:1 monoaddukten aus reaktiven olfinischen verbindungen und diisocyanaten und hydroxyterminierten polybutadienen |
Also Published As
Publication number | Publication date |
---|---|
JPH0128365B2 (ja) | 1989-06-02 |
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