JPS5659236A - Photoresist developing method - Google Patents

Photoresist developing method

Info

Publication number
JPS5659236A
JPS5659236A JP13546879A JP13546879A JPS5659236A JP S5659236 A JPS5659236 A JP S5659236A JP 13546879 A JP13546879 A JP 13546879A JP 13546879 A JP13546879 A JP 13546879A JP S5659236 A JPS5659236 A JP S5659236A
Authority
JP
Japan
Prior art keywords
film
substrate
photoresist film
photoresist
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13546879A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6335010B2 (enrdf_load_stackoverflow
Inventor
Shinya Kato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP13546879A priority Critical patent/JPS5659236A/ja
Publication of JPS5659236A publication Critical patent/JPS5659236A/ja
Publication of JPS6335010B2 publication Critical patent/JPS6335010B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP13546879A 1979-10-19 1979-10-19 Photoresist developing method Granted JPS5659236A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13546879A JPS5659236A (en) 1979-10-19 1979-10-19 Photoresist developing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13546879A JPS5659236A (en) 1979-10-19 1979-10-19 Photoresist developing method

Publications (2)

Publication Number Publication Date
JPS5659236A true JPS5659236A (en) 1981-05-22
JPS6335010B2 JPS6335010B2 (enrdf_load_stackoverflow) 1988-07-13

Family

ID=15152411

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13546879A Granted JPS5659236A (en) 1979-10-19 1979-10-19 Photoresist developing method

Country Status (1)

Country Link
JP (1) JPS5659236A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008071984A (ja) * 2006-09-15 2008-03-27 Tokyo Electron Ltd 露光・現像処理方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008071984A (ja) * 2006-09-15 2008-03-27 Tokyo Electron Ltd 露光・現像処理方法

Also Published As

Publication number Publication date
JPS6335010B2 (enrdf_load_stackoverflow) 1988-07-13

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