JPS5648130A - Structure of furnace core tube for semiconductor diffusion - Google Patents

Structure of furnace core tube for semiconductor diffusion

Info

Publication number
JPS5648130A
JPS5648130A JP12369279A JP12369279A JPS5648130A JP S5648130 A JPS5648130 A JP S5648130A JP 12369279 A JP12369279 A JP 12369279A JP 12369279 A JP12369279 A JP 12369279A JP S5648130 A JPS5648130 A JP S5648130A
Authority
JP
Japan
Prior art keywords
tube
section
furnace core
core tube
junction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12369279A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6127896B2 (enrdf_load_stackoverflow
Inventor
Kazunori Meguro
Masayoshi Yamaguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Coorstek KK
Original Assignee
Toshiba Ceramics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Ceramics Co Ltd filed Critical Toshiba Ceramics Co Ltd
Priority to JP12369279A priority Critical patent/JPS5648130A/ja
Publication of JPS5648130A publication Critical patent/JPS5648130A/ja
Publication of JPS6127896B2 publication Critical patent/JPS6127896B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67115—Apparatus for thermal treatment mainly by radiation

Landscapes

  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Furnace Details (AREA)
JP12369279A 1979-09-26 1979-09-26 Structure of furnace core tube for semiconductor diffusion Granted JPS5648130A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12369279A JPS5648130A (en) 1979-09-26 1979-09-26 Structure of furnace core tube for semiconductor diffusion

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12369279A JPS5648130A (en) 1979-09-26 1979-09-26 Structure of furnace core tube for semiconductor diffusion

Publications (2)

Publication Number Publication Date
JPS5648130A true JPS5648130A (en) 1981-05-01
JPS6127896B2 JPS6127896B2 (enrdf_load_stackoverflow) 1986-06-27

Family

ID=14866955

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12369279A Granted JPS5648130A (en) 1979-09-26 1979-09-26 Structure of furnace core tube for semiconductor diffusion

Country Status (1)

Country Link
JP (1) JPS5648130A (enrdf_load_stackoverflow)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58418U (ja) * 1981-06-24 1983-01-05 沖電気工業株式会社 半導体熱処理装置
JPS5944821A (ja) * 1982-09-07 1984-03-13 Toshiba Corp 半導体熱処理容器
JPS61152226A (ja) * 1984-12-26 1986-07-10 理研ビタミン株式会社 冷凍生地用品質改良剤
JPS62123066A (ja) * 1985-11-22 1987-06-04 東芝セラミツクス株式会社 熱処理用部材
JPH0311623A (ja) * 1989-06-09 1991-01-18 Toshiba Ceramics Co Ltd 半導体熱処理用炉芯管
JPH0311622A (ja) * 1989-06-09 1991-01-18 Toshiba Ceramics Co Ltd 排気キャップ
JPH0332020A (ja) * 1989-06-29 1991-02-12 Toshiba Ceramics Co Ltd 縦型拡散炉
JPH03241735A (ja) * 1990-02-20 1991-10-28 Toshiba Ceramics Co Ltd 半導体拡散炉用炉芯管
CN101826450A (zh) * 2009-03-04 2010-09-08 株式会社日立国际电气 衬底处理装置以及半导体装置的制造方法

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58418U (ja) * 1981-06-24 1983-01-05 沖電気工業株式会社 半導体熱処理装置
JPS5944821A (ja) * 1982-09-07 1984-03-13 Toshiba Corp 半導体熱処理容器
JPS61152226A (ja) * 1984-12-26 1986-07-10 理研ビタミン株式会社 冷凍生地用品質改良剤
JPS62123066A (ja) * 1985-11-22 1987-06-04 東芝セラミツクス株式会社 熱処理用部材
JPH0311623A (ja) * 1989-06-09 1991-01-18 Toshiba Ceramics Co Ltd 半導体熱処理用炉芯管
JPH0311622A (ja) * 1989-06-09 1991-01-18 Toshiba Ceramics Co Ltd 排気キャップ
JPH0332020A (ja) * 1989-06-29 1991-02-12 Toshiba Ceramics Co Ltd 縦型拡散炉
JPH03241735A (ja) * 1990-02-20 1991-10-28 Toshiba Ceramics Co Ltd 半導体拡散炉用炉芯管
CN101826450A (zh) * 2009-03-04 2010-09-08 株式会社日立国际电气 衬底处理装置以及半导体装置的制造方法

Also Published As

Publication number Publication date
JPS6127896B2 (enrdf_load_stackoverflow) 1986-06-27

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