JPS5648130A - Structure of furnace core tube for semiconductor diffusion - Google Patents

Structure of furnace core tube for semiconductor diffusion

Info

Publication number
JPS5648130A
JPS5648130A JP12369279A JP12369279A JPS5648130A JP S5648130 A JPS5648130 A JP S5648130A JP 12369279 A JP12369279 A JP 12369279A JP 12369279 A JP12369279 A JP 12369279A JP S5648130 A JPS5648130 A JP S5648130A
Authority
JP
Japan
Prior art keywords
tube
section
furnace core
core tube
junction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12369279A
Other languages
Japanese (ja)
Other versions
JPS6127896B2 (en
Inventor
Kazunori Meguro
Masayoshi Yamaguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Coorstek KK
Original Assignee
Toshiba Ceramics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Ceramics Co Ltd filed Critical Toshiba Ceramics Co Ltd
Priority to JP12369279A priority Critical patent/JPS5648130A/en
Publication of JPS5648130A publication Critical patent/JPS5648130A/en
Publication of JPS6127896B2 publication Critical patent/JPS6127896B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67115—Apparatus for thermal treatment mainly by radiation

Landscapes

  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Furnace Details (AREA)

Abstract

PURPOSE:To prevent gas leakage by providing cooling fins at a branch tube section at a gas induction side such as SiC or the like wherein a temperature at a junction section with a quartz glass tube is decreased to avoid thermal expansion. CONSTITUTION:Many fins 3 are provided at the end section 2 of the gas tube entrance side of a furnace core tube 1 made of SiC and a flange 4 is formed at an outside end. The furnace core tube 1 is connected to a junction tube 6 made of quartz glass through an Si rubber packing 5 to fix with a clasp 7. In this composition, thermal expansion at a junction section will be avoided and gas leakage will also be prevented by a complete seal. Furthermore, easy operation is attained because of the possibility of shortening the end section.
JP12369279A 1979-09-26 1979-09-26 Structure of furnace core tube for semiconductor diffusion Granted JPS5648130A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12369279A JPS5648130A (en) 1979-09-26 1979-09-26 Structure of furnace core tube for semiconductor diffusion

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12369279A JPS5648130A (en) 1979-09-26 1979-09-26 Structure of furnace core tube for semiconductor diffusion

Publications (2)

Publication Number Publication Date
JPS5648130A true JPS5648130A (en) 1981-05-01
JPS6127896B2 JPS6127896B2 (en) 1986-06-27

Family

ID=14866955

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12369279A Granted JPS5648130A (en) 1979-09-26 1979-09-26 Structure of furnace core tube for semiconductor diffusion

Country Status (1)

Country Link
JP (1) JPS5648130A (en)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58418U (en) * 1981-06-24 1983-01-05 沖電気工業株式会社 Semiconductor heat treatment equipment
JPS5944821A (en) * 1982-09-07 1984-03-13 Toshiba Corp Thermal treatment vessel for semiconductor
JPS61152226A (en) * 1984-12-26 1986-07-10 理研ビタミン株式会社 Quality modifier for frozen dough
JPS62123066A (en) * 1985-11-22 1987-06-04 東芝セラミツクス株式会社 Member for thermal process
JPH0311623A (en) * 1989-06-09 1991-01-18 Toshiba Ceramics Co Ltd Furnace tube for heat treatment of semiconductor
JPH0311622A (en) * 1989-06-09 1991-01-18 Toshiba Ceramics Co Ltd Exhaust cap
JPH0332020A (en) * 1989-06-29 1991-02-12 Toshiba Ceramics Co Ltd Vertical diffusing furnace
JPH03241735A (en) * 1990-02-20 1991-10-28 Toshiba Ceramics Co Ltd Furnace tube for semiconductor diffusion furnace
CN101826450A (en) * 2009-03-04 2010-09-08 株式会社日立国际电气 The manufacture method of lining processor and semiconductor device

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58418U (en) * 1981-06-24 1983-01-05 沖電気工業株式会社 Semiconductor heat treatment equipment
JPS5944821A (en) * 1982-09-07 1984-03-13 Toshiba Corp Thermal treatment vessel for semiconductor
JPS61152226A (en) * 1984-12-26 1986-07-10 理研ビタミン株式会社 Quality modifier for frozen dough
JPH0356698B2 (en) * 1984-12-26 1991-08-29
JPS62123066A (en) * 1985-11-22 1987-06-04 東芝セラミツクス株式会社 Member for thermal process
JPH0572351B2 (en) * 1985-11-22 1993-10-12 Toshiba Ceramics Co
JPH0311623A (en) * 1989-06-09 1991-01-18 Toshiba Ceramics Co Ltd Furnace tube for heat treatment of semiconductor
JPH0311622A (en) * 1989-06-09 1991-01-18 Toshiba Ceramics Co Ltd Exhaust cap
JPH0332020A (en) * 1989-06-29 1991-02-12 Toshiba Ceramics Co Ltd Vertical diffusing furnace
JPH03241735A (en) * 1990-02-20 1991-10-28 Toshiba Ceramics Co Ltd Furnace tube for semiconductor diffusion furnace
CN101826450A (en) * 2009-03-04 2010-09-08 株式会社日立国际电气 The manufacture method of lining processor and semiconductor device

Also Published As

Publication number Publication date
JPS6127896B2 (en) 1986-06-27

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