JPS5645093A - Manufacturing of semiconductor laser element - Google Patents
Manufacturing of semiconductor laser elementInfo
- Publication number
- JPS5645093A JPS5645093A JP12180779A JP12180779A JPS5645093A JP S5645093 A JPS5645093 A JP S5645093A JP 12180779 A JP12180779 A JP 12180779A JP 12180779 A JP12180779 A JP 12180779A JP S5645093 A JPS5645093 A JP S5645093A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- thickness
- type
- activated
- stress
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/005—Processes
- H01L33/0062—Processes for devices with an active region comprising only III-V compounds
Abstract
PURPOSE:To approximate stress of an activated layer to the minimum value and thereby to prolong lifetime of an element, in a double hetero-joint type semiconductor layer element, by controlling thickness of substrate and crystallized layer. CONSTITUTION:A laminated layer consisting of an N type GaAlAs is developed on an activated layer composed of GaAs or GaAlAs of N type or P type is developed on the above layer. Further, a P type GaAlAs laminated layer is piled on the layer, and by providing thus prepared layer with a GaAs contact layer, a double hetero-joint type semiconductor laser element is prepared. In such a constitution, if thickness of the substrate and the four layers are 100, 1, 0.2, 1 and 2mum, respectively, and mixed crystal ratio are 1.0, 0.75, 0.5, 0.3 and 0, respectively, stress of the activated layer can be shown by 11-15 curve. In other words, by controlling mixed crystal ratio when thickness is fixed or by controlling thickness when the mixed crystal ratio is fixed, stress to be caused to the activated layer can be largely reduced.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12180779A JPS5645093A (en) | 1979-09-20 | 1979-09-20 | Manufacturing of semiconductor laser element |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12180779A JPS5645093A (en) | 1979-09-20 | 1979-09-20 | Manufacturing of semiconductor laser element |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5645093A true JPS5645093A (en) | 1981-04-24 |
Family
ID=14820408
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12180779A Pending JPS5645093A (en) | 1979-09-20 | 1979-09-20 | Manufacturing of semiconductor laser element |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5645093A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58206184A (en) * | 1982-05-25 | 1983-12-01 | Sharp Corp | Semiconductor laser element and manufacture thereof |
-
1979
- 1979-09-20 JP JP12180779A patent/JPS5645093A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58206184A (en) * | 1982-05-25 | 1983-12-01 | Sharp Corp | Semiconductor laser element and manufacture thereof |
JPH0416033B2 (en) * | 1982-05-25 | 1992-03-19 | Sharp Kk |
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