JPS5639516A - Comparative inspecting mechanism of photomask - Google Patents

Comparative inspecting mechanism of photomask

Info

Publication number
JPS5639516A
JPS5639516A JP11509879A JP11509879A JPS5639516A JP S5639516 A JPS5639516 A JP S5639516A JP 11509879 A JP11509879 A JP 11509879A JP 11509879 A JP11509879 A JP 11509879A JP S5639516 A JPS5639516 A JP S5639516A
Authority
JP
Japan
Prior art keywords
patterns
light
masks
inspecting
movable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11509879A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6138448B2 (enrdf_load_stackoverflow
Inventor
Takao Furukawa
Kenichi Kobayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP11509879A priority Critical patent/JPS5639516A/ja
Publication of JPS5639516A publication Critical patent/JPS5639516A/ja
Publication of JPS6138448B2 publication Critical patent/JPS6138448B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Microscoopes, Condenser (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
JP11509879A 1979-09-10 1979-09-10 Comparative inspecting mechanism of photomask Granted JPS5639516A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11509879A JPS5639516A (en) 1979-09-10 1979-09-10 Comparative inspecting mechanism of photomask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11509879A JPS5639516A (en) 1979-09-10 1979-09-10 Comparative inspecting mechanism of photomask

Publications (2)

Publication Number Publication Date
JPS5639516A true JPS5639516A (en) 1981-04-15
JPS6138448B2 JPS6138448B2 (enrdf_load_stackoverflow) 1986-08-29

Family

ID=14654153

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11509879A Granted JPS5639516A (en) 1979-09-10 1979-09-10 Comparative inspecting mechanism of photomask

Country Status (1)

Country Link
JP (1) JPS5639516A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57212404A (en) * 1981-06-24 1982-12-27 Hitachi Ltd Comparison type inspector
JPS58168228A (ja) * 1982-08-24 1983-10-04 Fujitsu Ltd フオトマスクの比較検査方法と装置
JP2015014756A (ja) * 2013-07-08 2015-01-22 株式会社東芝 マスク歪計測装置および方法

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01263435A (ja) * 1988-04-13 1989-10-19 Harman Co Ltd 風呂用給湯装置の施設工法
JPH0579353U (ja) * 1992-03-23 1993-10-29 日本ユプロ株式会社 風呂アダプタへの配管接続構造

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57212404A (en) * 1981-06-24 1982-12-27 Hitachi Ltd Comparison type inspector
JPS58168228A (ja) * 1982-08-24 1983-10-04 Fujitsu Ltd フオトマスクの比較検査方法と装置
JP2015014756A (ja) * 2013-07-08 2015-01-22 株式会社東芝 マスク歪計測装置および方法

Also Published As

Publication number Publication date
JPS6138448B2 (enrdf_load_stackoverflow) 1986-08-29

Similar Documents

Publication Publication Date Title
ATE176416T1 (de) Laserbearbeitungsgerät
CA2246698A1 (en) Confocal microscope
DE59107380D1 (de) Röntgenmikroskop
ATE89671T1 (de) Kombinierte hellfeld-dunkelfeldauflichtbeleuchtungseinrichtung.
CA2094656A1 (en) Device Manufacture Involving Lithographic Process
JPS56142509A (en) Lighting device of microscope
KR910019132A (ko) 영상 노출 시스템 및 방법
JPS5612615A (en) High rosolution microscope
JPS5724943A (en) Image processing method and apparatus used for this
JPS5639516A (en) Comparative inspecting mechanism of photomask
JPS5246813A (en) Photographic optical system for observation for ophthalmofunduscopic c amera
JPS55121259A (en) Elelctron microscope
JPS5493974A (en) Projection-system mask alignment unit
JPS54160212A (en) Optical head for information processing
JP4818099B2 (ja) 特にマイクロリトグラフィー用マスクなどの対象物の検査装置
ATE243088T1 (de) Laserbearbeitungsvorrichtung
JPS55128243A (en) Electron microscope
JPS5528231A (en) Specimen device for scanning electron microscope or the like
JPS57200029A (en) Exposing device
JPS5520420A (en) Mtf examination unit
JPS6442812A (en) Production lot number exposure device
JPS56116259A (en) Transmissive electron microscope
JPS5250703A (en) Optical reading device for recording materials
SU1315876A1 (ru) Способ определени неосесимметричности в распределении зонной чувствительности светочувствительных слоев фотоприемников
GB874417A (en) Microscope comprising a beam-splitter for the simultaneous imaging of an object in several equivalent image planes