JPS5635480A - Light emitting diode - Google Patents
Light emitting diodeInfo
- Publication number
- JPS5635480A JPS5635480A JP11061379A JP11061379A JPS5635480A JP S5635480 A JPS5635480 A JP S5635480A JP 11061379 A JP11061379 A JP 11061379A JP 11061379 A JP11061379 A JP 11061379A JP S5635480 A JPS5635480 A JP S5635480A
- Authority
- JP
- Japan
- Prior art keywords
- type
- gaasp
- layer
- light emitting
- crystal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000013078 crystal Substances 0.000 abstract 4
- 238000010521 absorption reaction Methods 0.000 abstract 1
- 230000005540 biological transmission Effects 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/0004—Devices characterised by their operation
- H01L33/002—Devices characterised by their operation having heterojunctions or graded gap
- H01L33/0025—Devices characterised by their operation having heterojunctions or graded gap comprising only AIIIBV compounds
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Electrodes Of Semiconductors (AREA)
- Led Devices (AREA)
Abstract
PURPOSE:To improve the light emitting efficiency of the light emitting diode by bonding a crystal having the same conductivity type as the front and back surfaces of a GaAsP crystal having a P-N junction and larger energy gap than the crystalline surface thereof to the front and back of the GaAsP crystal. CONSTITUTION:When the P-N junction B of a GaAsP layer is forwardly biased, electrons 8 injected from an n type layer to a p type layer move within a diffused distance, and are recombined with holes 10. The junction depth is sufficiently increased in length as compared with the diffused distance, the light is absorbed in the crystal before the light is picked up from the surface, and light emitting efficiency is thus enhanced. Since the thickness L of the p type GaAsP layer is formed equally to the electron diffused distance and is bonded to the p type GaP of a band gap Eg1>Eg2, uncombined electrons 9 in the p type GaAsP reach the p type GaAsP layer. However, the electron 9 is moved to the low energy level transmission band, is recombined with the holes 10, and emits photons 12, and becomes in the energy equal to Eg2. Since it incorporates the front and back layers of Eg1>Eg2, no absorption on the front and back layer surfaces occur, and internal light can be externally picked up.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11061379A JPS5635480A (en) | 1979-08-29 | 1979-08-29 | Light emitting diode |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11061379A JPS5635480A (en) | 1979-08-29 | 1979-08-29 | Light emitting diode |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5635480A true JPS5635480A (en) | 1981-04-08 |
Family
ID=14540253
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11061379A Pending JPS5635480A (en) | 1979-08-29 | 1979-08-29 | Light emitting diode |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5635480A (en) |
-
1979
- 1979-08-29 JP JP11061379A patent/JPS5635480A/en active Pending
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