JPS5635419A - Pattern inspection device - Google Patents

Pattern inspection device

Info

Publication number
JPS5635419A
JPS5635419A JP11072279A JP11072279A JPS5635419A JP S5635419 A JPS5635419 A JP S5635419A JP 11072279 A JP11072279 A JP 11072279A JP 11072279 A JP11072279 A JP 11072279A JP S5635419 A JPS5635419 A JP S5635419A
Authority
JP
Japan
Prior art keywords
light
mask
signals
laser light
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11072279A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6156865B2 (enrdf_load_stackoverflow
Inventor
Katsumi Fujiwara
Masahito Nakajima
Taku Yoshida
Masayuki Oyama
Kikuo Mita
Tadao Nakakuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP11072279A priority Critical patent/JPS5635419A/ja
Publication of JPS5635419A publication Critical patent/JPS5635419A/ja
Publication of JPS6156865B2 publication Critical patent/JPS6156865B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
JP11072279A 1979-08-30 1979-08-30 Pattern inspection device Granted JPS5635419A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11072279A JPS5635419A (en) 1979-08-30 1979-08-30 Pattern inspection device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11072279A JPS5635419A (en) 1979-08-30 1979-08-30 Pattern inspection device

Publications (2)

Publication Number Publication Date
JPS5635419A true JPS5635419A (en) 1981-04-08
JPS6156865B2 JPS6156865B2 (enrdf_load_stackoverflow) 1986-12-04

Family

ID=14542821

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11072279A Granted JPS5635419A (en) 1979-08-30 1979-08-30 Pattern inspection device

Country Status (1)

Country Link
JP (1) JPS5635419A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5852981U (ja) * 1981-09-26 1983-04-11 不二製油株式会社 常温ゲル化性物質圧送装置
JPS59186323A (ja) * 1983-04-07 1984-10-23 Fujitsu Ltd パタ−ン検査方式
KR100447988B1 (ko) * 1998-10-27 2004-11-16 주식회사 하이닉스반도체 마스크패턴의결함검사방법

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6160667U (enrdf_load_stackoverflow) * 1984-09-25 1986-04-24
JPS61108316A (ja) * 1984-10-30 1986-05-27 九州積水工業株式会社 海苔の種付方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5254483A (en) * 1975-10-29 1977-05-02 Hitachi Ltd Method of inspecting photo mask patterns, etc.

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5254483A (en) * 1975-10-29 1977-05-02 Hitachi Ltd Method of inspecting photo mask patterns, etc.

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5852981U (ja) * 1981-09-26 1983-04-11 不二製油株式会社 常温ゲル化性物質圧送装置
JPS59186323A (ja) * 1983-04-07 1984-10-23 Fujitsu Ltd パタ−ン検査方式
KR100447988B1 (ko) * 1998-10-27 2004-11-16 주식회사 하이닉스반도체 마스크패턴의결함검사방법

Also Published As

Publication number Publication date
JPS6156865B2 (enrdf_load_stackoverflow) 1986-12-04

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