JPS5635414A - Method of liquid phase growth - Google Patents

Method of liquid phase growth

Info

Publication number
JPS5635414A
JPS5635414A JP11020579A JP11020579A JPS5635414A JP S5635414 A JPS5635414 A JP S5635414A JP 11020579 A JP11020579 A JP 11020579A JP 11020579 A JP11020579 A JP 11020579A JP S5635414 A JPS5635414 A JP S5635414A
Authority
JP
Japan
Prior art keywords
substrate
melts
substrates
growing
melt
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11020579A
Other languages
Japanese (ja)
Inventor
Osamu Hasegawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP11020579A priority Critical patent/JPS5635414A/en
Publication of JPS5635414A publication Critical patent/JPS5635414A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B19/00Liquid-phase epitaxial-layer growth
    • C30B19/06Reaction chambers; Boats for supporting the melt; Substrate holders
    • C30B19/063Sliding boat system

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Semiconductor Lasers (AREA)
  • Led Devices (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)

Abstract

PURPOSE:To avoid the wasting of materials when simultaneously growing epitaxial layers of various constructions on a plurality of substrates in accordance with a sliding method, by growing a succeeding melt on the second substrate while growing a preceding layer on the first substrate and by producing a preceding grown layer on the grown layer on the second substrate. CONSTITUTION:A plurality of substrate housing recesses are provided on a board 2 made of graphite. GaAs single crystal substrates 7a-7c and GaAs polycrystalline plates 8-10 are set in the recesses. A slider 3 having melt reservoirs and made of the same material as the board 2 is placed on its end so that a growing boat 1 is provided. Melts 4-6 in the reservoirs are brought into contact with the polycrystalline plates 8-10 first and heated to dissolve prescribed quantities of Ga and As from the plate 8 into the melts 4-6. After that, the slider 3 is moved to wet the substrates 7a-7c with the melts 4-6 and then wet the substrates 7a, 7b with the melts 5, 6 and finally bring the melt 6 into contact with only the substrate 7a. Double and single hetero-junctions are thereby produced.
JP11020579A 1979-08-31 1979-08-31 Method of liquid phase growth Pending JPS5635414A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11020579A JPS5635414A (en) 1979-08-31 1979-08-31 Method of liquid phase growth

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11020579A JPS5635414A (en) 1979-08-31 1979-08-31 Method of liquid phase growth

Publications (1)

Publication Number Publication Date
JPS5635414A true JPS5635414A (en) 1981-04-08

Family

ID=14529709

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11020579A Pending JPS5635414A (en) 1979-08-31 1979-08-31 Method of liquid phase growth

Country Status (1)

Country Link
JP (1) JPS5635414A (en)

Similar Documents

Publication Publication Date Title
JPS56138917A (en) Vapor phase epitaxial growth
JPS5635414A (en) Method of liquid phase growth
JPS5493380A (en) Semiconductor light emitting device
GB1526898A (en) Production of epitaxial layers on monocrystalline substrates
JPS54143780A (en) Manufacture of semiconductor sputtering target
JPS5587427A (en) Method and apparatus for liquid-phase epitaxial growth
JPS5351964A (en) Selective growth method for semiconductor crystal
JPS5724591A (en) Manufacture of semiconductor laser device
JPS53115181A (en) Production of semiconductor device
JPS5336182A (en) Thin semiconductor single crystal film forming insulation substrate
JPS52156781A (en) Growth of crystal with molecular beam
JPS5683933A (en) Liquid phase epitaxial growth
JPS52155189A (en) Multiple layer crystal growth
JPS54114089A (en) Hall element using gallium arsenide crystal
JPS533902A (en) Production of silicon crystal membrane
JPS54117679A (en) Liquid-phase epitaxial growth unit
JPS5335699A (en) Growing method for heteroepitaxial membrane
JPS57206033A (en) Method of liquid phase epitaxial growth
JPS52115784A (en) Liquid phase epitaxial growth
JPS52115783A (en) Liquid phase epitaxial growth
JPS53100770A (en) Production of epitaxial growth layer
JPS55145340A (en) Method for liquid phase epitaxial growth
JPS5478377A (en) Method and apparatus for growing semiconductor crystal
JPS5650508A (en) Manufacture monocrystalling semiconductor substrate and its
JPS52127500A (en) Production of linb1-taxo3 single crystal film