JPS5632655A - Electron beam device - Google Patents
Electron beam deviceInfo
- Publication number
- JPS5632655A JPS5632655A JP10716879A JP10716879A JPS5632655A JP S5632655 A JPS5632655 A JP S5632655A JP 10716879 A JP10716879 A JP 10716879A JP 10716879 A JP10716879 A JP 10716879A JP S5632655 A JPS5632655 A JP S5632655A
- Authority
- JP
- Japan
- Prior art keywords
- lens
- crossover
- channel
- shape
- electron
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/3002—Details
- H01J37/3007—Electron or ion-optical systems
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/302—Controlling tubes by external information, e.g. programme control
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Sources, Ion Sources (AREA)
- Electron Beam Exposure (AREA)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10716879A JPS5632655A (en) | 1979-08-24 | 1979-08-24 | Electron beam device |
DE19803031814 DE3031814A1 (de) | 1979-08-24 | 1980-08-22 | Elektronenstrahlvorrichtung |
US06/180,439 US4321510A (en) | 1979-08-24 | 1980-08-22 | Electron beam system |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10716879A JPS5632655A (en) | 1979-08-24 | 1979-08-24 | Electron beam device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5632655A true JPS5632655A (en) | 1981-04-02 |
Family
ID=14452199
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10716879A Pending JPS5632655A (en) | 1979-08-24 | 1979-08-24 | Electron beam device |
Country Status (3)
Country | Link |
---|---|
US (1) | US4321510A (ja) |
JP (1) | JPS5632655A (ja) |
DE (1) | DE3031814A1 (ja) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56161641A (en) * | 1980-05-16 | 1981-12-12 | Fujitsu Ltd | Exposure apparatus to electron beam |
JPS5856418A (ja) * | 1981-09-30 | 1983-04-04 | Fujitsu Ltd | 電子ビ−ム露光装置 |
JPS58145122A (ja) * | 1982-02-23 | 1983-08-29 | Jeol Ltd | 電子ビ−ム露光装置 |
JP2009010078A (ja) * | 2007-06-27 | 2009-01-15 | Nuflare Technology Inc | 電子ビーム描画装置及び電子ビームの電流密度調整方法 |
US7605381B2 (en) | 2001-05-30 | 2009-10-20 | Hitachi, Ltd. | Charged particle beam alignment method and charged particle beam apparatus |
JP2012109274A (ja) * | 2012-03-05 | 2012-06-07 | Hitachi Ltd | 荷電粒子線装置 |
JP2013080723A (ja) * | 2012-12-28 | 2013-05-02 | Hitachi Ltd | 荷電粒子線装置 |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0049872B1 (en) * | 1980-10-15 | 1985-09-25 | Kabushiki Kaisha Toshiba | Electron beam exposure system |
JPS5968158A (ja) * | 1982-09-27 | 1984-04-18 | Jeol Ltd | 電子線装置 |
JPS61190839A (ja) * | 1985-02-19 | 1986-08-25 | Canon Inc | 荷電粒子線装置 |
US4754334A (en) * | 1987-01-08 | 1988-06-28 | Management Graphics, Inc. | Image recorder having automatic alignment method and apparatus |
JPH0616405B2 (ja) * | 1987-09-02 | 1994-03-02 | 株式会社日立製作所 | 電子顕微鏡 |
CA1308203C (en) * | 1989-06-01 | 1992-09-29 | Nanoquest (Canada) Inc. | Magnification compensation apparatus |
US5483036A (en) * | 1993-10-28 | 1996-01-09 | Sandia Corporation | Method of automatic measurement and focus of an electron beam and apparatus therefor |
US5648188A (en) * | 1995-06-07 | 1997-07-15 | International Business Machines Corporation | Real time alignment system for a projection electron beam lithographic system |
US5798528A (en) * | 1997-03-11 | 1998-08-25 | International Business Machines Corporation | Correction of pattern dependent position errors in electron beam lithography |
US6555830B1 (en) * | 2000-08-15 | 2003-04-29 | Applied Materials, Inc. | Suppression of emission noise for microcolumn applications in electron beam inspection |
US7223974B2 (en) * | 2002-05-22 | 2007-05-29 | Applied Materials, Israel, Ltd. | Charged particle beam column and method for directing a charged particle beam |
KR101041661B1 (ko) * | 2003-07-30 | 2011-06-14 | 어플라이드 머티리얼즈 이스라엘 리미티드 | 다중 검출기들을 갖는 스캐닝 전자 현미경 및 다중 검출기기반 이미징을 위한 방법 |
JP2006203107A (ja) * | 2005-01-24 | 2006-08-03 | Toshiba Corp | 荷電ビーム描画装置 |
US20070210041A1 (en) * | 2006-03-02 | 2007-09-13 | The Regents Of The University Of California | Automatic focusing of electron beams using a modified Faraday cup diagnostic |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4979454A (ja) * | 1972-12-06 | 1974-07-31 | ||
JPS5468149A (en) * | 1977-11-11 | 1979-06-01 | Erionikusu Kk | Electron ray application device |
-
1979
- 1979-08-24 JP JP10716879A patent/JPS5632655A/ja active Pending
-
1980
- 1980-08-22 DE DE19803031814 patent/DE3031814A1/de not_active Ceased
- 1980-08-22 US US06/180,439 patent/US4321510A/en not_active Expired - Lifetime
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4979454A (ja) * | 1972-12-06 | 1974-07-31 | ||
JPS5468149A (en) * | 1977-11-11 | 1979-06-01 | Erionikusu Kk | Electron ray application device |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56161641A (en) * | 1980-05-16 | 1981-12-12 | Fujitsu Ltd | Exposure apparatus to electron beam |
JPH027173B2 (ja) * | 1980-05-16 | 1990-02-15 | Fujitsu Ltd | |
JPS5856418A (ja) * | 1981-09-30 | 1983-04-04 | Fujitsu Ltd | 電子ビ−ム露光装置 |
JPS58145122A (ja) * | 1982-02-23 | 1983-08-29 | Jeol Ltd | 電子ビ−ム露光装置 |
US7605381B2 (en) | 2001-05-30 | 2009-10-20 | Hitachi, Ltd. | Charged particle beam alignment method and charged particle beam apparatus |
JP2009010078A (ja) * | 2007-06-27 | 2009-01-15 | Nuflare Technology Inc | 電子ビーム描画装置及び電子ビームの電流密度調整方法 |
JP4676461B2 (ja) * | 2007-06-27 | 2011-04-27 | 株式会社ニューフレアテクノロジー | 電子ビーム描画装置及び電子ビームの電流密度調整方法 |
JP2012109274A (ja) * | 2012-03-05 | 2012-06-07 | Hitachi Ltd | 荷電粒子線装置 |
JP2013080723A (ja) * | 2012-12-28 | 2013-05-02 | Hitachi Ltd | 荷電粒子線装置 |
Also Published As
Publication number | Publication date |
---|---|
US4321510A (en) | 1982-03-23 |
DE3031814A1 (de) | 1981-03-26 |
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