JPS561934A - Manufacture of resist image - Google Patents

Manufacture of resist image

Info

Publication number
JPS561934A
JPS561934A JP7849679A JP7849679A JPS561934A JP S561934 A JPS561934 A JP S561934A JP 7849679 A JP7849679 A JP 7849679A JP 7849679 A JP7849679 A JP 7849679A JP S561934 A JPS561934 A JP S561934A
Authority
JP
Japan
Prior art keywords
resist
irradiated
less
solvent
polymer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7849679A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6314342B2 (cs
Inventor
Yoshitake Onishi
Shigeyoshi Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHIYOU LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHIYOU LSI GIJUTSU KENKYU KUMIAI filed Critical CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority to JP7849679A priority Critical patent/JPS561934A/ja
Publication of JPS561934A publication Critical patent/JPS561934A/ja
Publication of JPS6314342B2 publication Critical patent/JPS6314342B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP7849679A 1979-06-21 1979-06-21 Manufacture of resist image Granted JPS561934A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7849679A JPS561934A (en) 1979-06-21 1979-06-21 Manufacture of resist image

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7849679A JPS561934A (en) 1979-06-21 1979-06-21 Manufacture of resist image

Publications (2)

Publication Number Publication Date
JPS561934A true JPS561934A (en) 1981-01-10
JPS6314342B2 JPS6314342B2 (cs) 1988-03-30

Family

ID=13663571

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7849679A Granted JPS561934A (en) 1979-06-21 1979-06-21 Manufacture of resist image

Country Status (1)

Country Link
JP (1) JPS561934A (cs)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63165844A (ja) * 1986-12-27 1988-07-09 Terumo Corp レジスト材料
JPH08262738A (ja) * 1995-03-27 1996-10-11 Agency Of Ind Science & Technol 微細パターン形成方法
JPH09236932A (ja) * 1997-03-10 1997-09-09 Agency Of Ind Science & Technol 微細パターン形成方法
WO2015016194A1 (ja) * 2013-08-02 2015-02-05 富士フイルム株式会社 パターン形成方法、感活性光線性又は感放射線性樹脂組成物、レジスト膜、電子デバイスの製造方法、及び電子デバイス

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63127055U (cs) * 1987-02-12 1988-08-19
EP3206326B1 (en) 2014-10-06 2020-05-06 LG Electronics Inc. Method and apparatus for transmitting data on resource units including pilot tones in wlan

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63165844A (ja) * 1986-12-27 1988-07-09 Terumo Corp レジスト材料
JPH08262738A (ja) * 1995-03-27 1996-10-11 Agency Of Ind Science & Technol 微細パターン形成方法
JPH09236932A (ja) * 1997-03-10 1997-09-09 Agency Of Ind Science & Technol 微細パターン形成方法
WO2015016194A1 (ja) * 2013-08-02 2015-02-05 富士フイルム株式会社 パターン形成方法、感活性光線性又は感放射線性樹脂組成物、レジスト膜、電子デバイスの製造方法、及び電子デバイス
JP2015031836A (ja) * 2013-08-02 2015-02-16 富士フイルム株式会社 パターン形成方法、感活性光線性又は感放射線性樹脂組成物、レジスト膜、電子デバイスの製造方法、及び電子デバイス

Also Published As

Publication number Publication date
JPS6314342B2 (cs) 1988-03-30

Similar Documents

Publication Publication Date Title
US5707777A (en) Light-sensitive composition
JPS5280022A (en) Light solubilizable composition
EP0361907A3 (en) Photoresist compositions for deep uv image reversal
JPS5290269A (en) Forming method for fine resist patterns
GB1473194A (en) Positive working resist masks
GB1514109A (en) Method of making resist mask on a substrate
JPS5635130A (en) Resist material and method for forming resist pattern
JPS5569265A (en) Pattern-forming method
KR900018737A (ko) 방사능 민감성 혼합물 및 양각패턴의 제조방법
JPS5744143A (en) Composition and method for forming micropattern
JPS56162744A (en) Formation of fine pattern
KR910001455A (ko) 근자외선 방사(near ultraviolet radiation)에 의해 고해상도(高解象度)를 나타내는 산 경화 광저항물(Acid hardening photoresists)에 있어서 선택된 광활성 조성물의 사용법
JPS561934A (en) Manufacture of resist image
JPH10274845A5 (cs)
JPS57202534A (en) Negative type resist composition
JPS5677843A (en) Resist pattern forming method
DE3664824D1 (en) Process for producing a positive photoresist
JPS5324782A (en) Forming method of high molecular film patterns by negative resist
JPS55164825A (en) Polymer positive image forming method
JPS52143769A (en) Removing method of positive type photo resist
JPS55134847A (en) Manufacture of resist image
JPS5397047A (en) Photosensitive resin composition
JPS5421271A (en) Pattern forming method
JPS5640823A (en) Forming method of negative type photoresist pattern
JPS52117077A (en) Electron beam-exposing method