KR910001455A - 근자외선 방사(near ultraviolet radiation)에 의해 고해상도(高解象度)를 나타내는 산 경화 광저항물(Acid hardening photoresists)에 있어서 선택된 광활성 조성물의 사용법 - Google Patents

근자외선 방사(near ultraviolet radiation)에 의해 고해상도(高解象度)를 나타내는 산 경화 광저항물(Acid hardening photoresists)에 있어서 선택된 광활성 조성물의 사용법 Download PDF

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KR910001455A
KR910001455A KR1019900008971A KR900008971A KR910001455A KR 910001455 A KR910001455 A KR 910001455A KR 1019900008971 A KR1019900008971 A KR 1019900008971A KR 900008971 A KR900008971 A KR 900008971A KR 910001455 A KR910001455 A KR 910001455A
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image
photoresist
acid
ultraviolet radiation
radiation
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KR1019900008971A
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KR0155990B1 (ko
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에드먼드 휠리 웨인
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윌리암 이 램버트 3세
롬 앤드 하스 컴퍼니
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y10S430/121—Nitrogen in heterocyclic ring
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/122—Sulfur compound containing
    • Y10S430/123—Sulfur in heterocyclic ring
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/126—Halogen compound containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/127—Spectral sensitizer containing

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)

Abstract

내용 없음

Description

근자외선 방사(near ultraviloet radiation)에 의해 고해상도(高解象度)를 나타내는 산경화 광저항물(Acid hardening photoresists)에 있어서 선택된 광활성 조성물의 사용법
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (10)

  1. 하기의 것을 포함하는 고해상도 음성 광저항물의 영상물등의 제조법: 광저항 조성물이 근 자외선 방사에 감광된 패턴양식, 언급된 광저항물이 페노티아진 유도체, 강한 UV광산 생성제 및 산경화 수지 시스템을 포함하며, 언급된 저항물이 가열되고 비감광된 영역들을 현상액으로 제거해서 영상을 현상하는 것.
  2. 하기의 것을 포함하는 고해상도 음성 광저항물의 영상물들의 제조법: 패턴에서 근 자외선 방사의 효과적인 양에 대해 광저항 조성물의 층의 감광된 부분들, 언급된 광저항물이 하기의 것을 포함하는 것 : 약0.50내지 약98%의 산 경화수지; 근 자외선 방사에 반응해서 효과적인 양의 산을 생성하지 않는 약 0.5내지 약25%의 강한 UV광산 생성제와 하기의 구조식을 갖는 약0.5내지 약25%의 감광제;
    상기식에서, X는 유황이나 산소이고, R은 수소 또는 C1-C6알킬이 될 수 있으며, R1은 수소, 할로겐 또는 C1-C6알킬, 치환되거나 비치환될 수 있다; 언급된 광산 생성제를 근 자외선 방사에 민감하게 하는 것; 언급된 광저항물을 감광된 영역에서 반응을 선택적으로 유발하기 위해 가열하는 것; 광저항물의 비감광된 부분을 선택적으로 제거하기위해 영상을 현상하는 것.
  3. 광저항 조성물이 근 자외선 방사에 대해 감광되는 것을 포함하는 고해상도 음성 광저항물의 제조법, 언급된 광저항물이 산경화 수지 시스템과 광산 생성제로서 2-클로록페노티아진을 포함하는 것.
  4. 근 UV방사를 사용해서 작동하는 감광 장치와 함께 사용되는 음성 광저항 조성물이 산 경화 수지 시스템, 근 UV에 반응해서 충분한 산을 생성하지 않는 강한 UV광산 생성제 및 하기 구조식의 감광제를 포함하는 것;
    상기식에서, X는 유황이나 산소이고, R은 수소나 C1-C6알킬이며, R1은 수소, 할로겐이나 C1-C6알킬, 치환되거나 비치환되며, 근 UV방사에 감광되어 강한 UV광산 생성제로 하여금 산을 생성시킨다.
  5. 근 UV방사를 사용해서 작동하는 감광 장치와 함께 사용되는 음성 광저항 조성물이 산 경화 수지 시스템과 2-클로로페노티아진을 포함하는 것.
  6. 초미세한 모양을 포함하고 수직 측벽 단면을 갖는 릴리이프영상을 생성하기 위한 음성 광저항 조성물이 제4항의 광저항물을 포함하는 근 UV방사에 사용되는 것.
  7. 제6항에 있어서, 영상이 100미크론 이상의 깊이를 가진 모양을 포함하는 것.
  8. 제7항에 있어서, 영상이 200미크론 이상의 깊이를 가진 모양을 포함하는 것.
  9. 제7항에 있어서, 영상이 불투명, 투명 및 부분적으로 빛을 투과시키는 영역을 가진 마스크를 사용해서 저항물이 감광됨에 따라 새성된 하나 이상의 표면 상승을 갖는 것.
  10. 생성물 확인 마커가 제 2항의 방법에 따라 생성된 명백하게 알아볼 수 있는 모양의 현미경으로 판별할 수 있는 자유-부유영상을 포함하는 것.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019900008971A 1989-06-20 1990-06-19 근자외선 방사에 의해 고해상도를 나타내는 산 경화 광저항물에 있어서 선택된 광활성 조성물의 사용법 KR0155990B1 (ko)

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Application Number Priority Date Filing Date Title
US36943889A 1989-06-20 1989-06-20
US369438 1989-06-20
US369,438 1989-06-20

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KR910001455A true KR910001455A (ko) 1991-01-30
KR0155990B1 KR0155990B1 (ko) 1998-11-16

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US (1) US5391465A (ko)
EP (1) EP0404499A3 (ko)
JP (1) JP3026503B2 (ko)
KR (1) KR0155990B1 (ko)
CN (1) CN1048931A (ko)
AU (1) AU5764390A (ko)
BR (1) BR9002906A (ko)
CA (1) CA2017338A1 (ko)
FI (1) FI903096A0 (ko)
IE (1) IE902217A1 (ko)
IL (1) IL94799A (ko)
NO (1) NO902666L (ko)
ZA (1) ZA904704B (ko)

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Also Published As

Publication number Publication date
IE902217L (en) 1990-12-20
ZA904704B (en) 1991-03-27
BR9002906A (pt) 1991-08-20
IE902217A1 (en) 1991-01-16
US5391465A (en) 1995-02-21
JP3026503B2 (ja) 2000-03-27
CA2017338A1 (en) 1990-12-20
CN1048931A (zh) 1991-01-30
IL94799A (en) 1994-02-27
IL94799A0 (en) 1991-04-15
AU5764390A (en) 1991-01-03
KR0155990B1 (ko) 1998-11-16
FI903096A0 (fi) 1990-06-19
NO902666L (no) 1990-12-21
EP0404499A2 (en) 1990-12-27
NO902666D0 (no) 1990-06-15
EP0404499A3 (en) 1992-03-18
JPH0387748A (ja) 1991-04-12

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