JPS5617341A - Alignment stage for step and repeat exposure - Google Patents

Alignment stage for step and repeat exposure

Info

Publication number
JPS5617341A
JPS5617341A JP9262579A JP9262579A JPS5617341A JP S5617341 A JPS5617341 A JP S5617341A JP 9262579 A JP9262579 A JP 9262579A JP 9262579 A JP9262579 A JP 9262579A JP S5617341 A JPS5617341 A JP S5617341A
Authority
JP
Japan
Prior art keywords
traveling
fine
wafer
moving mechanism
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9262579A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6320014B2 (enrdf_load_stackoverflow
Inventor
Hiroo Kinoshita
Munenori Kanai
Tadao Saito
Kazue Yoshida
Shinichi Yamazaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP9262579A priority Critical patent/JPS5617341A/ja
Publication of JPS5617341A publication Critical patent/JPS5617341A/ja
Publication of JPS6320014B2 publication Critical patent/JPS6320014B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Machine Tool Units (AREA)
JP9262579A 1979-07-23 1979-07-23 Alignment stage for step and repeat exposure Granted JPS5617341A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9262579A JPS5617341A (en) 1979-07-23 1979-07-23 Alignment stage for step and repeat exposure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9262579A JPS5617341A (en) 1979-07-23 1979-07-23 Alignment stage for step and repeat exposure

Publications (2)

Publication Number Publication Date
JPS5617341A true JPS5617341A (en) 1981-02-19
JPS6320014B2 JPS6320014B2 (enrdf_load_stackoverflow) 1988-04-26

Family

ID=14059617

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9262579A Granted JPS5617341A (en) 1979-07-23 1979-07-23 Alignment stage for step and repeat exposure

Country Status (1)

Country Link
JP (1) JPS5617341A (enrdf_load_stackoverflow)

Cited By (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5950538A (ja) * 1982-09-17 1984-03-23 Hitachi Ltd ウエハ搬送装置
JPS60218650A (ja) * 1984-04-16 1985-11-01 Canon Inc パタ−ン露光方法
JPS60223119A (ja) * 1984-04-20 1985-11-07 Hitachi Ltd ２軸方向非接触駆動形精密移動台
JPS615545U (ja) * 1984-06-14 1986-01-14 宏臣 小笠原 直進移動テ−ブル
JPS6130345A (ja) * 1984-07-20 1986-02-12 Omron Tateisi Electronics Co 静圧空気浮上ステ−ジ
JPS6131170A (ja) * 1984-07-24 1986-02-13 菊地　眞 ハイパサ−ミア用加温装置
US4588288A (en) * 1983-07-01 1986-05-13 Canon Kabushiki Kaisha Static pressure bearing and transport device utilizing the same
JPS61125749A (ja) * 1984-11-21 1986-06-13 Disco Abrasive Sys Ltd 複合テ−ブル
JPS6276644A (ja) * 1985-09-30 1987-04-08 Toshiba Corp 露光装置の縦型移動テーブル装置
JPS62156425U (enrdf_load_stackoverflow) * 1986-03-27 1987-10-05
JPH09129712A (ja) * 1996-07-29 1997-05-16 Canon Inc 半導体製造装置
US6072183A (en) * 1991-09-18 2000-06-06 Canon Kabushiki Kaisha Stage device for an exposure apparatus and semiconductor device manufacturing method which uses said stage device
JP2002365026A (ja) * 2001-06-07 2002-12-18 Sigma Technos Kk 基板検査装置
JP2008235889A (ja) * 2007-03-20 2008-10-02 Asml Netherlands Bv 振動絶縁サポートデバイスを含むリソグラフィ装置
EP2037137A3 (en) * 2001-02-27 2009-09-23 Canon Kabushiki Kaisha Stage device
JP2009258195A (ja) * 2008-04-14 2009-11-05 Hitachi High-Technologies Corp プロキシミティ露光装置、プロキシミティ露光装置の基板移動方法、及び表示用パネル基板の製造方法
JP2009258196A (ja) * 2008-04-14 2009-11-05 Hitachi High-Technologies Corp プロキシミティ露光装置、プロキシミティ露光装置の基板移動方法、及び表示用パネル基板の製造方法
JP2010110860A (ja) * 2008-11-06 2010-05-20 Oiles Ind Co Ltd 平面移動ステージ装置
JP2012128417A (ja) * 2010-12-10 2012-07-05 Leica Microsystems Cms Gmbh 顕微鏡ステージ
CN117826546A (zh) * 2024-02-28 2024-04-05 无锡迪思微电子有限公司 掩模版承载机构及掩模版量测机台

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5528118A (en) 1994-04-01 1996-06-18 Nikon Precision, Inc. Guideless stage with isolated reaction stage
US6989647B1 (en) 1994-04-01 2006-01-24 Nikon Corporation Positioning device having dynamically isolated frame, and lithographic device provided with such a positioning device

Cited By (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5950538A (ja) * 1982-09-17 1984-03-23 Hitachi Ltd ウエハ搬送装置
US4588288A (en) * 1983-07-01 1986-05-13 Canon Kabushiki Kaisha Static pressure bearing and transport device utilizing the same
JPS60218650A (ja) * 1984-04-16 1985-11-01 Canon Inc パタ−ン露光方法
JPS60223119A (ja) * 1984-04-20 1985-11-07 Hitachi Ltd ２軸方向非接触駆動形精密移動台
JPS615545U (ja) * 1984-06-14 1986-01-14 宏臣 小笠原 直進移動テ−ブル
JPS6130345A (ja) * 1984-07-20 1986-02-12 Omron Tateisi Electronics Co 静圧空気浮上ステ−ジ
JPS6131170A (ja) * 1984-07-24 1986-02-13 菊地　眞 ハイパサ−ミア用加温装置
JPS61125749A (ja) * 1984-11-21 1986-06-13 Disco Abrasive Sys Ltd 複合テ−ブル
JPS6276644A (ja) * 1985-09-30 1987-04-08 Toshiba Corp 露光装置の縦型移動テーブル装置
JPS62156425U (enrdf_load_stackoverflow) * 1986-03-27 1987-10-05
US6504160B2 (en) 1991-09-18 2003-01-07 Canon Kabushiki Kaisha Stage device for an exposure apparatus and semiconductor device manufacturing method which uses said stage device
US6072183A (en) * 1991-09-18 2000-06-06 Canon Kabushiki Kaisha Stage device for an exposure apparatus and semiconductor device manufacturing method which uses said stage device
JPH09129712A (ja) * 1996-07-29 1997-05-16 Canon Inc 半導体製造装置
EP2037137A3 (en) * 2001-02-27 2009-09-23 Canon Kabushiki Kaisha Stage device
JP2002365026A (ja) * 2001-06-07 2002-12-18 Sigma Technos Kk 基板検査装置
JP2008235889A (ja) * 2007-03-20 2008-10-02 Asml Netherlands Bv 振動絶縁サポートデバイスを含むリソグラフィ装置
US8102505B2 (en) 2007-03-20 2012-01-24 Asml Netherlands B.V. Lithographic apparatus comprising a vibration isolation support device
JP2009258195A (ja) * 2008-04-14 2009-11-05 Hitachi High-Technologies Corp プロキシミティ露光装置、プロキシミティ露光装置の基板移動方法、及び表示用パネル基板の製造方法
JP2009258196A (ja) * 2008-04-14 2009-11-05 Hitachi High-Technologies Corp プロキシミティ露光装置、プロキシミティ露光装置の基板移動方法、及び表示用パネル基板の製造方法
JP2010110860A (ja) * 2008-11-06 2010-05-20 Oiles Ind Co Ltd 平面移動ステージ装置
JP2012128417A (ja) * 2010-12-10 2012-07-05 Leica Microsystems Cms Gmbh 顕微鏡ステージ
CN117826546A (zh) * 2024-02-28 2024-04-05 无锡迪思微电子有限公司 掩模版承载机构及掩模版量测机台

Also Published As

Publication number Publication date
JPS6320014B2 (enrdf_load_stackoverflow) 1988-04-26

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